IP Library Granted Patent US 10,145,796
Granted Patent B2
US 10,145,796 · App. 15/424,817 · Granted Dec 4, 2018

Illumination filter for an illumination filter system of a surgical multispectral fluorescence microscope having a spatial filter pattern

Inventors: Manfred Kuster (Widnau, CH); George Themelis (Lindau, DE)
Assignee: Leica Instruments (Singapore) Pte. Ltd.
G01N21/6458A61B1/043A61B1/0646G01N21/64G02B21/06G02B21/16F21V9/40G01N2021/6471G01N2201/068G02B5/201G02B26/008G02B26/023
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Quick Facts
Patent No.
US 10,145,796
App. No.
15/424,817
Granted
Dec 4, 2018
Kind
B2
Abstract

The invention relates to an illumination filter ( 36, 44 ) for an illumination filter system ( 2 ) for medical imaging, in particular multispectral fluorescence imaging, as performed e.g. in a microscope ( 1 ) or endoscope, in particular a multispectral fluorescence microscope. The present invention provides an illumination filter for medical imaging, in particular a multispectral fluorescence imaging, that is capable of capturing simultaneously more than one fluorescence signal, and allow a homogeneous illumination for obtaining different images from the object illuminated by comprising a spatial filter pattern ( 43 ) masking a defined filtering fraction of a first illumination path ( 47 ) on the filter and masking a defined filtering fraction of a second illumination path ( 48, 49, 50 ) on the filter, wherein the filtering fraction of the first and the second illumination paths ( 47, 48, 49, 50 ) are different. The invention further relates to an illumination filter system ( 2 ) for medical imaging, in particular multispectral fluorescence imaging, as performed e.g. in a microscope ( 1 ) or endoscope, in particular a multispectral fluorescence microscope, comprising such illumination filter ( 36, 44 ).

Claims (14)

1. An illumination filter ( 36 , 44 ) for an illumination filter system ( 2 ) for medical imaging ( 1 ), in particular multispectral fluorescence imaging, comprising a spatial filter pattern ( 43 ) masking a defined filtering fraction of a first illumination path ( 47 ) on the filter and masking a defined filtering fraction of a second illumination path ( 48 , 49 , 50 ) on the filter, wherein the filtering fraction of the first and the second illumination paths ( 47 , 48 , 49 , 50 ) are different, wherein the spatial filter pattern ( 43 ) comprises a plurality of filter patches ( 51 ), and wherein respective centers ( 53 ) of adjacent filter patches ( 51 ) are essentially spaced equidistantly and respective areas (A) of the filter patches ( 51 ) vary.

2. The illumination filter ( 36 , 44 ) of claim 1 , wherein a filter coating ( 42 ) is applied as the spatial filter pattern ( 43 ) on a substrate ( 41 ), said coating ( 42 ) defining the filtering fraction of the first and the second illumination paths ( 47 , 48 , 49 , 50 ) on the substrate ( 41 ).

3. The illumination filter ( 36 , 44 ) of claim 2 , wherein the spatial filter pattern ( 43 ) is a band-stop filter pattern ( 43 a ) or a band-pass filter pattern ( 43 b ).

4. The illumination filter ( 36 , 44 ) of claim 3 , wherein a band-stop filter coating ( 42 ) or a band-pass filter coating ( 46 ) is applied as the spatial filter pattern ( 43 ) on the substrate ( 41 ).

5. The illumination filter ( 36 , 44 ) of claim 1 , wherein the spatial filter pattern ( 43 ) extends over a plurality of illumination paths ( 47 - 50 ) and the filtering fraction is different in each illumination path ( 47 - 50 ).

6. The illumination filter ( 36 , 44 ) of claim 5 , wherein the plurality of illumination paths ( 47 - 50 ) is arranged along an axis of the illumination filter ( 36 , 44 ).

7. An illumination filter ( 36 , 44 ) for an illumination filter system ( 2 ) for medical imaging ( 1 ), in particular multispectral fluorescence imaging, comprising a spatial filter pattern ( 43 ) masking a defined filtering fraction of a first illumination path ( 47 ) on the filter and masking a defined filtering fraction of a second illumination path ( 48 , 49 , 50 ) on the filter, wherein the filtering fraction of the first and the second illumination paths ( 47 , 48 , 49 , 50 ) are different, wherein the spatial filter pattern ( 43 ) comprises a plurality of filter patches ( 51 ), and wherein the filter patches ( 51 ) are filter squares ( 52 ).

8. The illumination filter ( 36 , 44 ) of claim 7 , wherein respective diagonal lengths ( 1 ) of the filter squares ( 52 ) varies in different illumination paths ( 47 - 50 ).

9. The illumination filter ( 36 , 44 ) of claim 8 , wherein the diagonal length ( 1 ) of the filter squares ( 52 ) varies along an axis of the illumination filter ( 36 , 44 ).

10. An illumination filter system ( 2 ) for a microscope ( 1 ), in particular a multispectral fluorescence microscope, comprising an illumination filter ( 36 , 44 ) having a spatial filter pattern ( 43 ) masking a defined filtering fraction of a first illumination path ( 47 ) on the filter and masking a defined filtering fraction of a second illumination path ( 48 , 49 , 50 ) on the filter, wherein the filtering fraction of the first and the second illumination paths ( 47 , 48 , 49 , 50 ) are different, wherein the spatial filter pattern ( 43 ) comprises a plurality of filter patches ( 51 ), and wherein respective centers ( 53 ) of adjacent filter patches ( 51 ) are essentially spaced equidistantly and respective areas (A) of the filter patches ( 51 ) vary.

11. The illumination filter system ( 2 ) of claim 10 , wherein the illumination filter ( 36 , 44 ) is configured to be moved from a first operation position ( 37 ), in which the first illumination path ( 47 ) is in optical communication with a light source ( 4 ), to a second operation position ( 38 ), in which the second illumination path ( 48 - 50 ) is in optical communication with a light source ( 4 ).

12. The illumination filter system ( 2 ) of claim 10 , comprising a first illumination filter ( 36 ) having a spatial band-stop filter pattern ( 43 a ) and a second illumination filter ( 44 ) having a spatial band-pass filter pattern ( 43 b ), wherein each of the first and second illumination filters ( 36 , 44 ) is configured to be moved from a first operation position ( 37 ), in which the first illumination path ( 47 ) is in optical communication with a light source ( 4 ), to a second operation position ( 38 ), in which the second illumination path ( 48 - 50 ) is in optical communication with a light source ( 4 ).

13. The illumination filter system ( 2 ) of claim 10 , further comprising a blocking filter ( 35 ) adapted to quench light of a fluorescence emission band (Em. 1 , Em. 2 ).

14. An illumination filter system ( 2 ) for a microscope ( 1 ), in particular a multispectral fluorescence microscope, comprising an illumination filter ( 36 , 44 ) having a spatial filter pattern ( 43 ) masking a defined filtering fraction of a first illumination path ( 47 ) on the filter and masking a defined filtering fraction of a second illumination path ( 48 , 49 , 50 ) on the filter, wherein the filtering fraction of the first and the second illumination paths ( 47 , 48 , 49 , 50 ) are different, wherein the spatial filter pattern ( 43 ) comprises a plurality of filter patches ( 51 ), and wherein the filter patches ( 51 ) are filter squares ( 52 ).

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 4, 2017
From: KUSTER, MANFRED; THEMELIS, GEORGE
To: LEICA INSTRUMENTS (SINGAPORE) PTE. LTD.
Reel/Frame 041174/0108 →
Priority Claims (1)
EP 16155624 · Feb 15, 2016 · regional
Continuity (1)
Related Publication 20170234796A1 · Aug 17, 2017
Cited By (1)
US 12,239,409