Methods of forming connector pad structures, interconnect structures, and structures thereof
Methods of forming connector pad structures, interconnect structures, and structures thereof are disclosed. In some embodiments, a method of forming a connector pad structure includes forming an underball metallization (UBM) pad, and increasing a surface roughness of the UBM pad by exposing the UBM pad to a plasma treatment. A polymer material is formed over a first portion of the UBM pad, leaving a second portion of the UBM pad exposed.
1. A structure comprising:
a first redistribution layer (RDL);
an underball metallization (UBM) pad disposed over a portion of the first RDL, a rough surface of the UBM pad having a surface roughness, wherein the surface roughness is approximately 0.18 μm to approximately 0.25 μm;
a polymer material disposed over a first portion of the rough surface of the UBM pad;
an intermetallic compound (IMC) disposed over a second portion of the rough surface of the UBM pad; and
a connector disposed over the IMC.
2. The structure of claim 1 , wherein the connector comprises Sn.
3. The structure of claim 2 , wherein the IMC comprises CuSn.
4. The structure of claim 1 , further comprising an integrated circuit die coupled to the RDL, wherein portions of the RDL are coupled to contact pads of the integrated circuit die.
5. The structure of claim 4 , further comprising:
molding material disposed around the integrated circuit die, the RDL extending over the integrated circuit die and the molding material; and
plurality of through vias disposed within the molding material.
6. The structure of claim 5 , wherein the integrated circuit die comprises a first side and a second side opposite the first side, wherein the first RDL is proximate the first side of the integrated circuit die, and further comprising a second RDL proximate the second side of the integrated circuit die.
7. The structure of claim 6 , further comprising a packaged integrated circuit coupled to the first RDL or the second RDL.
8. A semiconductor device comprising:
an integrated circuit die comprising a first connector pad and a second connector pad;
a first underball metallization (UBM) pad electrically coupled to the first connector pad, the first UBM pad comprising a first rough surface, the first rough surface having a first surface roughness, wherein the first surface roughness is approximately 0.18 μm to approximately 0.25 μm;
a second UBM pad electrically coupled to the second connector pad, the second UBM pad comprising a second rough surface, the second rough surface having a second surface roughness, wherein the second surface roughness is approximately 0.18 μm to approximately 0.25 μm;
a first polymer material disposed over a first portion of the first rough surface of the first UBM pad;
a second polymer material disposed over a first portion of the second rough surface of the second UBM pad, the first polymer material being separate from the second polymer material;
a first connector disposed over the first UBM pad;
a second connector disposed over the second UBM pad;
a first intermetallic compound (IMC) interposed between a second portion of the first rough surface of the first UBM pad and the first connector; and
a second IMC interposed between a second region of the second rough surface of the second UBM pad and the second connector.
9. The semiconductor device of claim 8 , further comprising a molding material disposed around the integrated circuit die.
10. The semiconductor device of claim 9 , further comprising a plurality of through vias disposed within the molding material.
11. The semiconductor device of claim 10 , wherein the first UBM is laterally over the molding material.
12. The semiconductor device of claim 9 , further comprising an insulating material layer disposed over the integrated circuit die and the molding material, wherein a bottommost surface of the first polymer material and a bottommost surface of the second polymer material are lower than an uppermost surface of the insulating material layer.
13. The semiconductor device of claim 8 , wherein a portion of the first polymer material is formed on sidewalls of the first UBM pad and a portion of the second polymer material is formed on sidewalls of the second UBM pad.
14. The semiconductor device of claim 13 , wherein the portion of the first polymer material is along a periphery of the second portion of the first UBM pad and the portion of the second polymer material is along a periphery of the second portion of the second UBM pad.
15. The semiconductor device of claim 8 , wherein the first UBM pad is electrically coupled to the first connector pad through a first plurality of conductive lines and a first plurality of conductive vias.
16. A semiconductor device comprising:
an integrated circuit die comprising a first side and a second side opposite the first side, the first side comprising a plurality of contact pads;
a first interconnect structure on the first side of the integrated circuit die, the first interconnect structure comprising:
a plurality of first underball metallization (UBM) pads, each of the plurality of first UBM pads comprising a first rough surface having a first surface roughness, wherein the first surface roughness is approximately 0.18 μm to approximately 0.25 μm; and
a plurality of first polymer structures, each of the plurality of first polymer structures being disposed over a first portion of the first rough surface of respective ones of the plurality of first UBM pads;
a second interconnect structure on the second side of the integrated circuit die, the second interconnect structure comprising a plurality of second UBM pads, wherein at least one of the plurality of second UBM pads is electrically coupled to a second subset of the plurality of first UBM pads by a through via;
a plurality of first connectors, each of the plurality of first connectors disposed over a second portion of the first rough surface of respective ones of the plurality of first UBM pads; and
a plurality of second connectors, each of the plurality of second connectors disposed over respective ones of the plurality of second UBM pads.
17. The semiconductor device of claim 16 , further comprising a molding material disposed around the integrated circuit die.
18. The semiconductor device of claim 17 , wherein the through via is disposed in the molding material.
19. The semiconductor device of claim 16 , wherein each of the plurality of second UBM pads comprise a fourth rough surface having a second surface roughness, wherein the second surface roughness is approximately 0.18 μm to approximately 0.25 μm, further comprising a plurality of second polymer structures, each of the plurality of second polymer structures is disposed over a first portion of the fourth rough surface of respective ones of the plurality of second UBM pads, wherein the plurality of second connectors is disposed over a second portion of the fourth rough surface of respective ones of the plurality of second UBM pads.
20. The semiconductor device of claim 16 , wherein the first interconnect structure further comprises a plurality of intermetallic compounds (IMC) interposed between the plurality of first UBM pads and the plurality of first connectors.