Methods for producing perovskite halide films
View Patent ↗An aspect of the present disclosure is a method that includes exchanging at least a portion of a first cation of a perovskite solid with a second cation, where the exchanging is performed by exposing the perovskite solid to a precursor of the second cation, such that the precursor of the second cation oxidizes to form the second cation and the first cation reduces to form a precursor of the first cation.
1. A method comprising:
exposing a first perovskite comprising a first cation, lead, and iodine to a gas comprising at least one of formylimidamide, guanidine, acetamidine, ethylamine, or methylammonia, wherein:
the exposing is performed at a temperature between 100° C. and 300° C.,
the exposing results in an exchange of the first cation with a second cation comprising at least one of methylammonium, formamidinium, guanidinium, acetamidinium, or ethylammonium, and
the exchange converts the first perovskite to a second perovskite comprising lead, iodine, and the second cation.
2. The method of claim 1 , wherein the exposing is performed with the gas at a pressure of one atmosphere.
3. The method of claim 1 , wherein the first perovskite is in a form comprising at least one of a particle or a film.
4. The method of claim 1 , wherein the first perovskite comprises ABX 3 , A comprises the first cation, B comprises Pb 2+ , and X comprises I − .
5. The method of claim 4 , wherein the first cation comprises methylammonium.
6. The method of claim 5 , wherein the second cation comprises formamidinium.
7. The method of claim 5 , wherein the exposing results in the formation of methylammonia.
8. The method of claim 1 , wherein the second perovskite comprises at least one of methylammonium lead triiodide, formamidinium lead triiodide, guanidinium lead triiodide, acetamidinium lead triiodide, or ethylammonium lead triiodide.
9. The method of claim 1 , further comprising:
prior to the exposing, forming the first perovskite by at least one of a solution deposition method or a vapor deposition method.
10. The method of claim 1 , further comprising:
prior to the exposing, reacting formamidine acetate with sodium hydroxide to form the formylimidamide.