Method for using a hydrocyclone for cryogenic gas vapor separation
A method for separating a vapor from a carrier gas is disclosed. A hydrocyclone is provided with one or more nozzles on the wall of the hydrocyclone. A cryogenic liquid is provided to the tangential feed inlet at a velocity that induces a tangential flow and a cyclone vortex in the hydrocyclone. The carrier gas is injected into the hydrocyclone through the one or more nozzles. The vapor dissolves, condenses, desublimates, or a combination thereof, forming a vapor-depleted carrier gas and a vapor-enriched cryogenic liquid. The vapor-depleted gas is drawn through the vortex finder while the vapor-enriched cryogenic liquid is drawn through the apex nozzle outlet. In this manner, the vapor is removed from the carrier gas.
1. A method for separating a vapor from a carrier gas, the method comprising:
providing a hydrocyclone comprising:
a vessel having a generally cylindrical shape with a generally circular cross-section;
a tangential feed inlet for a cryogenic liquid, attached to a cylindrical wall of the vessel on an upper end of the vessel such that injected fluids form a tangential flow and a cyclone vortex;
a vortex finder outlet on a top of the vessel, perpendicular to the tangential feed inlet;
a lower section of the vessel that tapers conically down in size to an apex nozzle outlet;
at least a portion of a wall of the hydrocyclone comprising one or more nozzles; and,
sizing the vessel, the tangential feed inlet, the vortex finder, the lower section, and the apex nozzle outlet to cause a gas/liquid separation;
providing the cryogenic liquid to the tangential feed inlet at a velocity that induces the tangential flow and the cyclone vortex in the hydrocyclone;
injecting the carrier gas into the hydrocyclone through the one or more nozzles;
wherein the vapor dissolves, condenses, desublimates, or a combination thereof, forming a vapor-depleted carrier gas and a vapor-enriched cryogenic liquid; the vapor-depleted gas is drawn through the vortex finder while the vapor-enriched cryogenic liquid is drawn through the apex nozzle outlet;
whereby the vapor is removed from the carrier gas.
2. The method of claim 1 , wherein the vapor comprises carbon dioxide, nitrogen oxide, sulfur dioxide, nitrogen dioxide, sulfur trioxide, hydrogen sulfide, hydrogen cyanide, water, hydrocarbons with a freezing point above 0 C, or combinations thereof.
3. The method of claim 1 , wherein the carrier gas comprises combustion flue gas, syngas, producer gas, natural gas, steam reforming gas, any hydrocarbon that has higher volatility than water, light gases, or combinations thereof.
4. The method of claim 1 , wherein the cryogenic liquid comprises any compound or mixture of compounds with a freezing point below a temperature at which a solid forms from the vapor.
5. The method of claim 1 , wherein the vessel, the tangential feed inlet, the vortex finder, the lower section, and the apex nozzle outlet comprise aluminum, stainless steel, polymers, ceramics, or combinations thereof.
6. The method of claim 1 , wherein the one or more nozzles have injection points that are flush with an inner side of the wall of the hydrocyclone.
7. The method of claim 6 , wherein any surface of the injection points exposed to the cryogenic liquid comprise a material that inhibits adsorption of gases, prevents deposition of solids, or a combination thereof.
8. The method of claim 7 , wherein the material comprises ceramics, polytetrafluoroethylene, polychlorotrifluoroethylene, natural diamond, man-made diamond, chemical-vapor deposition diamond, polycrystalline diamond, or combinations thereof.
9. The method of claim 6 , wherein the one or more nozzles are attached parallel to the tangential feed inlet to cause a tangential carrier gas stream to inject with the tangential flow of the cryogenic liquid.
10. The method of claim 9 , wherein any surface of the injection points exposed to the cryogenic liquid comprise a material that inhibits adsorption of gases, prevents deposition of solids, or a combination thereof.
11. The method of claim 10 , wherein the material comprises ceramics, polytetrafluoroethylene, polychlorotrifluoroethylene, natural diamond, man-made diamond, chemical-vapor deposition diamond, polycrystalline diamond, or combinations thereof.
12. The method of claim 6 , wherein the one or more nozzles are attached anti-parallel to the tangential feed inlet to cause a tangential carrier gas stream to inject against the tangential flow of the cryogenic liquid.
13. The method of claim 12 , wherein any surface of the injection points exposed to the cryogenic liquid comprise a material that inhibits adsorption of gases, prevents deposition of solids, or a combination thereof.
14. The method of claim 13 , wherein the material comprises ceramics, polytetrafluoroethylene, polychlorotrifluoroethylene, natural diamond, man-made diamond, chemical-vapor deposition diamond, polycrystalline diamond, or combinations thereof.
15. The method of claim 6 , wherein the one or more nozzles are attached tangentially to the wall of the hydrocyclone, are staggered around a perimeter of the wall of the hydrocyclone, and are oriented to inject with the tangential flow of the cryogenic liquid.
16. The method of claim 15 , wherein any surface of the injection points exposed to the cryogenic liquid comprise a material that inhibits adsorption of gases, prevents deposition of solids, or a combination thereof.
17. The method of claim 16 , wherein the material comprises ceramics, polytetrafluoroethylene, polychlorotrifluoroethylene, natural diamond, man-made diamond, chemical-vapor deposition diamond, polycrystalline diamond, or combinations thereof.
18. The method of claim 6 , wherein the one or more nozzles are attached tangentially to the wall of the hydrocyclone, are staggered around a perimeter of the wall of the hydrocyclone, and are oriented to inject against the tangential flow of the cryogenic liquid.
19. The method of claim 15 , wherein any surface of the injection points exposed to the cryogenic liquid comprise a material that inhibits adsorption of gases, prevents deposition of solids, or a combination thereof.
20. The method of claim 16 , wherein the material comprises ceramics, polytetrafluoroethylene, polychlorotrifluoroethylene, natural diamond, man-made diamond, chemical-vapor deposition diamond, polycrystalline diamond, or combinations thereof.