Semiconductor device manufacturing method
View Patent ↗A semiconductor device manufacturing method includes forming a first resist and a second resist on a stacked body that includes a plurality of first films and a plurality of second films, the second resist facing one or more side surfaces of the first resist; forming a third film in a slit between the first resist and the second resist, the third film covering the side surfaces of the first resist and defining exposed surfaces of the first resist not covered by the third film; performing a first etch of the stacked body from an upper surface using the first resist, the second resist, and the third film as a mask; selectively etching the one or more exposed surfaces of the first resist and the second resist; and performing a second etch of the stacked body from the upper surface using the first resist and the third film as a mask.
1. A semiconductor device manufacturing method, comprising:
forming a first resist and a second resist on a stacked body that comprises a plurality of first films and a plurality of second films, the first resist comprising at least four side surfaces, the second resist facing one or more of the side surfaces of the first resist;
forming a third film in a slit between the first resist and the second resist, the third film covering the one or more side surfaces of the first resist and defining one or more exposed surfaces of the first resist not covered by the third film;
performing a first etch of the stacked body from an upper surface thereof using the first resist, the second resist, and the third film as a mask;
selectively etching the one or more exposed surfaces of the first resist and the second resist; and
performing a second etch of the stacked body from the upper surface using the first resist and the third film as a mask.
2. The semiconductor device manufacturing method according to claim 1 , wherein selectively etching the one or more exposed surfaces of the first resist and etching of the stacked body are alternately repeated.
3. The semiconductor device manufacturing method according to claim 1 , wherein the third film is formed using a silicon oxide or a metal oxide.
4. The semiconductor device manufacturing method according to claim 3 , wherein the third film is formed by applying the silicon oxide or the metal oxide into the slit using a spin coating technique.
5. The semiconductor device manufacturing method according to claim 1 , further comprising:
forming a fourth film on the upper surface of the stacked body using a silicon nitride or polysilicon; and
forming the first resist, the second resist, and the third film on the fourth film.
6. The semiconductor device manufacturing method according to claim 1 , wherein:
the first resist is formed into a rectangular shape to have four side surfaces, and
the second resist is formed into a U-shape to face three side surfaces out of the four side surfaces.
7. The semiconductor device manufacturing method according to claim 1 , wherein the first films are formed using a silicon oxide, and the second films are formed using a silicon nitride.
8. The semiconductor device manufacturing method according to claim 1 , wherein selectively etching the one or more exposed surfaces of the first resist comprises reducing a coverage area of the first resist.
9. The semiconductor device manufacturing method according to claim 1 , wherein the third film is formed at a film formation temperature different from that of the first films and the second films.
10. A semiconductor device manufacturing method, comprising:
forming a first resist and a second resist on a stacked body that comprises a plurality of first films and a plurality of second films, the second resist facing a plurality of side surfaces of the first resist;
forming a third film in a slit between the first resist and the second resist, the third film covering the plurality of side surfaces of the first resist and defining an exposed surface of the first resist not covered by the third film;
performing a first etch of the stacked body from an upper surface thereof using the first resist, the second resist, and the third film as a mask;
selectively etching the exposed surface of the first resist and the second resist to reduce a coverage area of the first resist; and
performing a second etch of the stacked body from the upper surface using the first resist and the third film as a mask.
11. The semiconductor device manufacturing method according to claim 10 , wherein selectively etching the exposed surface of the first resist and etching of the stacked body are alternately repeated.
12. The semiconductor device manufacturing method according to claim 10 , wherein the third film is formed using a silicon oxide or a metal oxide.
13. The semiconductor device manufacturing method according to claim 12 , wherein the third film is formed by coating the silicon oxide or the metal oxide into the slit.
14. The semiconductor device manufacturing method according to claim 10 , further comprising:
forming a fourth film on the upper surface of the stacked body using a silicon nitride or polysilicon; and
forming the first resist, the second resist, and the third film on the fourth film.
15. The semiconductor device manufacturing method according to claim 10 , wherein:
the first resist is formed into a rectangular shape to have four side surfaces, and
the second resist is formed into a U-shape to face three side surfaces out of the four side surfaces.
16. The semiconductor device manufacturing method according to claim 10 , wherein the first films are formed using a silicon oxide, and the second films are formed using a silicon nitride.
17. The semiconductor device manufacturing method according to claim 10 , wherein selectively etching the exposed surface of the first resist comprises reducing a coverage area of the first resist.
18. The semiconductor device manufacturing method according to claim 10 , wherein the third film is formed at a film formation temperature different from that of the first films and the second films.
19. A semiconductor device manufacturing method comprising:
forming a first resist and a second resist on a stacked body that comprises a plurality of first films and a plurality of second films, the second resist facing a plurality of side surfaces of the first resist;
forming a third film in a slit between the first resist and the second resist, the third film covering the plurality of side surfaces of the first resist and defining an exposed surface of the first resist not covered by the third film;
performing a first etch of the stacked body from an upper surface thereof using the first resist, the second resist, and the third film as a mask;
performing a first selective etch of the exposed surface of the first resist and the second resist to reduce a coverage area of the first resist and remove the second resist;
performing a second etch of the stacked body from the upper surface using the first resist and the third film as a mask;
performing a third etch of the exposed surface of the first resist to further reduce the coverage area of the first resist; and
performing a fourth etch of the stacked body from the upper surface using the first resist and the third film as a mask to form a stepped region of the stacked body.