Substrate processing device and method of manufacturing semiconductor device
A substrate processing device capable of stabilizing an etching amount of a metal film provided on a substrate is provided. The substrate processing device includes a first container, a second container and a control unit. The first container stores a first liquid in which an acid solution containing phosphoric acid and water are mixed. The first liquid is capable of etching a metal film provided on a substrate. The second container stores a second liquid containing water. The control unit controls supply of the second liquid from the second container to the first container such that a water concentration of the first liquid increases over time corresponding to change in a concentration of the phosphoric acid in the first liquid.
1. A substrate processing device, comprising:
a first container configured to store a first liquid in which an acid liquid containing phosphoric acid and water are mixed, the first liquid being capable of etching a metal film provided on a substrate;
a second container configured to store a second liquid containing water; and
a control unit that controls supply of the second liquid from the second container to the first container such that a water concentration of the first liquid increases over time corresponding to change in a concentration of the phosphoric acid in the first liquid.
2. The substrate processing device according to claim 1 , further comprising:
a water concentration meter for detecting the water concentration,
wherein the control unit controls the supply of the second liquid such that a detection value of the water concentration meter matches a set value of the water concentration that is preset for each supply start time of the second liquid.
3. The substrate processing device according to claim 1 , further comprising:
a phosphoric acid concentration meter for detecting the concentration of the phosphoric acid, a viscometer for detecting a viscosity of the first liquid, or a specific gravity meter for detecting a specific gravity of the first liquid,
wherein the control unit controls the supply of the second liquid based on a detection result of the phosphoric acid concentration meter, the viscometer or the specific gravity meter.
4. The substrate processing device according to claim 1 , further comprising:
a circulation path for circulating the first liquid with respect to the first container, and
a current meter for detecting a flow velocity of the first liquid flowing through the circulation path,
wherein the control unit controls the supply of the second liquid based on a detection result of the current meter.
5. The substrate processing device according to claim 1 , wherein
the control unit intermittently supplies the second liquid based on a supply amount which is preset so as to increase over time.
6. The substrate processing device according to claim 1 , wherein
the control unit intermittently supplies the second liquid at intervals which are preset so as to be shortened over time.