Composition analysis method and composition analysis system

1. A composition analysis method comprising:

determining a plurality of intensities by iteratively performing a process of:

irradiating a sample with an ion beam;

determining a thickness of a specific portion of the sample that is thinned by the irradiation of the ion beam;

irradiating the specific portion of the sample that is thinned by the irradiation of the ion beam with an electron beam; and

detecting an intensity of an X-ray generated from the sample by the irradiation of the electron beam, the intensity including at least a first intensity corresponding to a first element and a second intensity corresponding to a second element;

determining a plurality of parameter values based on a ratio of the first intensity and the second intensity included in the determined plurality of intensities;

determining a first linear function based on a correlation between the determined plurality of parameter values and the determined thickness using an extrapolation method;

determining a calculated parameter value which corresponds to a theoretical point where the thickness becomes zero; and

performing a composition analysis using the calculated parameter value.

2. The method according to claim 1 ,

wherein the irradiation of the ion beam, the irradiation of the electron beam, and the detection of the intensity of the X-ray are performed in a same location.

3. The method according to claim 1 ,

wherein at least two of the irradiation of the ion beam, the irradiation of the electron beam, and the detection of the intensity of the X-ray are performed in different locations.

4. The method according to claim 1 ,

wherein the iterative process is repeated a predetermined number of times, and then the determining the identity of the element included in the sample is performed.

5. The method according to claim 1 , wherein:

the sample is irradiated with the ion beam from a first direction, and

the sample is irradiated with the electron beam from a second direction different from the first direction.

6. The method according to claim 1 , further comprising:

detecting an electron transmitted through the sample at the time of the irradiation of the electron beam.

7. The method according to claim 1 , wherein the calculated parameter value is a P 0 -intercept of the first linear function.

8. The method according to claim 7 , further comprising determining an absorption correction factor based on the P 0 -intercept.

9. A composition analysis system comprising:

an ion beam irradiation device configured to irradiate a sample with an ion beam;

an electron beam irradiation device configured to irradiate a specific portion of the sample that is thinned by the irradiation of the ion beam with an electron beam;

an X-ray detector configured to detect an intensity of an X-ray generated from the sample by the irradiation of the electron beam; and

an analysis control device configured to control the ion beam irradiation device, the electron beam irradiation device, and the X-ray detector to:

determine a plurality of intensities by iteratively performing a process of:

irradiating the sample with the ion beam;

determining a thickness of the specific portion of the sample that is thinned by the irradiation of the ion beam;

irradiating the specific portion of the sample that is thinned by the irradiation of the ion beam with the electron beam; and

detecting the intensity of the X-ray generated from the sample by the irradiation of the electron beam, the intensity including at least a first intensity corresponding to a first element and a second intensity corresponding to a second element;

determine a plurality of parameter values based on a ratio of the first intensity and the second intensity included in the determined plurality of intensities;

determine a first linear function based on a correlation between the determined plurality of parameter values and the determined thickness using an extrapolation method;

determine a calculated parameter value which corresponds to a theoretical point where the thickness becomes zero; and

perform a composition analysis using the calculated parameter value.

10. The system according to claim 9 , wherein the calculated parameter value is a P 0 -intercept of the first linear function.

11. The system according to claim 10 , wherein the analysis control device is further configured to determine an absorption correction factor based on the P 0 -intercept.