Coated article having low-E coating with IR reflecting layer(s) and hafnium inclusive high index nitrided dielectric layer
A coated article includes a low emissivity (low-E) coating having at least one infrared (IR) reflecting layer of a material such as silver, gold, or the like, and at least one hafnium (Hf) inclusive high index nitrided dielectric layer. In certain example embodiments, the hafnium inclusive high index nitrided dielectric layer(s) may be of or include one or more of HfSiAlN, HfZrSiAlN, HfSiN, HfAlN, and/or HfAlZrN. The high index layer may be a transparent dielectric high index layer, with a high refractive index (n) and/or low k value. In example embodiments, the low-E coating may be used in applications such as monolithic or insulating glass (IG) window units, vehicle windows, or the like.
1. A coated article including a coating supported by a glass substrate, the coating comprising:
a first dielectric layer on the glass substrate;
an infrared (IR) reflecting layer comprising silver on the glass substrate, located over at least the first dielectric layer;
a second dielectric layer on the glass substrate, located over at least the IR reflecting layer; and
wherein the second dielectric layer comprises a nitride of hafnium (Hf), contains from 0-10% oxygen (atomic %), has a refractive index (n) of at least 2.21 at 550 nm, and further comprises at least one of Zr, Si, and Al.
2. The coated article of claim 1 , wherein the layer comprising the nitride of Hf further comprises Si.
3. The coated article of claim 1 , wherein the layer comprising the nitride of Hf further comprises Si and Al.
4. The coated article of claim 1 , wherein the layer comprising the nitride of Hf further comprises Zr.
5. The coated article of claim 1 , wherein the layer comprising the nitride of Hf further comprises Zr and Si.
6. The coated article of claim 1 , wherein the layer comprising the nitride of Hf further comprises Zr, Si and Al.
7. The coated article of claim 1 , wherein the layer comprising the nitride of Hf has a refractive index of at least 2.25 (at 550 nm).
8. The coated article of claim 1 , wherein the layer comprising the nitride of Hf has an absorption coefficient (k) of no greater than 0.015 (at 400 nm).
9. The coated article of claim 1 , wherein the layer comprising the nitride of Hf has an absorption coefficient (k) of no greater than 0.010 (at 400 nm).
10. The coated article of claim 1 , wherein the coated article undergoes a change in refractive index (n), at 550 nm, of no more than 0.04 due to heat treatment at 650° C. heat treatment for 8 minutes.
11. The coated article of claim 1 , wherein the coated article undergoes a change in refractive index (n), at 550 nm, of no more than 0.01 due to heat treatment at 650° C. heat treatment for 8 minutes.
12. The coated article of claim 1 , wherein the layer comprising the nitride of Hf contains from 0-5% oxygen (atomic %).
13. The coated article of claim 1 , wherien the layer comprising the nitride of Hf contains from 0-2% oxygen (atomic %).
14. The coated article of claim 1 , wherein the coating is a low-E coating and has a normal emissivity (E n ) of no greater than 0.2.
15. The coated article of claim 1 , wherein the coating is a low-E coating and has a normal emissivity (E n ) of no greater than 0.10.
16. The coated article of claim 1 , wherein the layer comprising the nitride of Hf is amorphous or substantially amorphous.
17. The coated article of claim 1 , wherein the first dielectric layer comprises the nitride of hafnium (Hf), contains from 0-10% oxygen (atomic %), has a refractive index (n) of at least 2.21 at 550 nm, has an absorption coefficient k of no greater than 0.02 at 400 nm, and further comprises at least one of Zr, Si, and Al, and is located between at least the glass substrate and the IR reflecting layer.
18. The coated article of claim 1 , wherein the second dielectric layer comprises the nitride of hafnium (Hf), contains from 0-10% oxygen (atomic %), has a refractive index (n) of at least 2.21 at 550 nm, has an absorption coefficient k of no greater than 0.02 at 400 nm, and further comprises at least one of Zr, Si, and Al, and is located on the glass substrate over at least the IR reflecting layer.
19. The coated article of claim 18 , wherein the coating further comprises a layer comprising silicon nitride located over and directly contacting the layer comprising the nitride of Hf.
20. The coated article of claim 1 , wherein the coating further comprises a layer comprising silicon nitride located between at least the glass substrate and the first transparent dielectric layer.
21. The coated article of claim 1 , wherein the coating further comprises a layer comprising zinc oxide located under and directly contacting the IR reflecting layer.
22. The coated article of claim 1 , wherein the coating further comprises a layer comprising Ni and/or Cr located over and directly contacting the IR reflecting layer.
23. The coated article of claim 1 , wherein the coating further comprises a layer comprising an oxide of titanium that is directly contacting the second dielectric layer, and wherein the second dielectric layer: comprises a nitride of hafnium (Hf), contains from 0-10% oxygen (atomic %), has a refractive index (n) of at least 2.21 at 550 nm, and further comprises at least one of Zr, Si, and Al.
24. The coated article of claim 1 , wherein the coated article is thermally tempered.
25. The coated article of claim 1 , wherein the coated article has a visible transmission of at least 50%.
26. The coated article of claim 1 , wherein the layer comprising the nitride of Hf has a metal content comprising from 10-75% Hf.
27. The coated article of claim 1 , wherein the layer comprising the nitride of Hf has a metal content comprising from 20-70% Hf.
28. The coated article of claim 1 , wherein the layer comprising the nitride of Hf has a metal content comprising from 25-40% Hf.
29. The coated article of claim 1 , wherein the layer comprising the nitride of Hf has a metal content comprising from 20-70% Hf, from 1-40% Zr, from 3-20% Si, and from 1-45% Al (atomic %).
30. The coated article of claim 1 , wherein the layer comprising the nitride of Hf contains more Hf than Si, and more Hf than Al (atomic %).
31. The coated article of claim 1 , wherein the layer comprising the nitride of Hf further includes Zr, and where Hf and Zr contents summed together represent from 45-75% of metal content of the layer comprising the nitride of Hf (atomic %).
32. The coated article of claim 1 , wherein the layer comprising the nitride of Hf further includes Zr, and where Hf and Zr contents summed together represent from 50-70% of metal content of the layer comprising the nitride of Hf (atomic %).
33. The coated article of claim 1 , wherein the layer comprising the nitride of Hf is substantially free of Ti and Nb.
34. The coated article of claim 1 , wherein the layer comprising the nitride of Hf contains from 0-5% Ti and from 0-5% Nb.
35. A coated article including a coating supported by a glass substrate, the coating comprising:
a first dielectric layer on the glass substrate;
an infrared (IR) reflecting layer on the glass substrate, located over at least the first dielectric layer;
a second dielectric layer on the glass substrate, located over at least the IR reflecting layer;
a third dielectric layer on the glass substrate and located over at least the first and second dielectric layers; and
wherein the second dielectric layer comprises a nitride of hafnium (Hf), has a refractive index (n) of at least 2.21 at 550 nm, and further comprises at least one of Zr, Si, and Al.
36. The coated article of claim 35 , wherein the layer comprising the nitride of Hf further comprises Al and contains at least twice as much Al as Hf.
37. The coated article of claim 35 , wherein the layer comprising the nitride of Hf further comprises Al and Zr, and contain at least twice as much Al as Hf, and at least twice as much Al as Zr.
38. The coated article of claim 35 , wherein the third dielectric layer comprises silicon nitride.
39. The coated article of claim 35 , wherein the layer comprising the nitride of Hf is substantially free of Ti and Nb.
40. A method of making a coated article including a coating supported by a glass substrate, the method comprising:
sputter depositing a first dielectric layer on the glass substrate;
sputter depositing a second dielectric layer on the glass substrate, located over at least the first dielectric layer;
sputter depositing a third dielectric layer on the glass substrate and located over at least the first and second dielectric layers; and
wherein the second dielectric layer comprises a nitride of hafnium (Hf), has a refractive index (n) of at least 2.21 at 550 nm, and further comprises at least one of Zr, Si, and Al.