Coating composition, and process for producing photoresist laminate

1. A coating composition, comprising:

a fluorinated polymer having a unit represented by formula (1); and

a fluorinated compound represented by formula (2), wherein the content of the fluorinated compound is from 0.1 to 8.0 parts by mass per 100 parts by mass of the fluorinated polymer, and the fluorinated polymer has number average molecular weight of from 1,000 to 30,000:

—[CX 1 CX 2 —CY 1 (Rf 1 —COOM 1 )]—  (1)

wherein X 1 and X 2 are each independently a hydrogen atom, a fluorine atom or a chlorine atom, Y 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a methyl group or a trifluoromethyl group, Rf 1 is a perfluoroalkylene group which may contain an etheric oxygen atom between carbon-carbon atoms, or an oxyperfluoroalkylene group which may contain an etheric oxygen atom between carbon-carbon atoms, the number of carbon atoms in Rf 1 is from 1 to 10 or in the case that Rf 1 contains the etheric oxygen atom, from 2 to 10, and —COOM 1 is —COOH or —COOZ 1 , wherein Z 1 is an ammonium ion in which the hydrogen atom may be substituted;

CX 3 X 4 ═CY 2 (Rf 2 —COOM 2 )  (2)

wherein X 3 and X 4 are each independently a hydrogen atom, a fluorine atom or a chlorine atom, Y 2 is a hydrogen atom, a fluorine atom, a chlorine atom, a methyl group or a trifluoromethyl group, Rf 2 is a perfluoroalkylene group which may contain an etheric oxygen atom between carbon-carbon atoms, or an oxyperfluoroalkylene group which may contain an etheric oxygen atom between carbon-carbon atoms, the number of carbon atoms in Rf 2 is from 1 to 10 or in the case that Rf 2 contains the etheric oxygen atom, from 2 to 10, and —COOM 2 is —COOH or —COOZ 2 , wherein Z 2 is an ammonium ion in which the hydrogen atom may be substituted.

2. The coating composition according to claim 1 , wherein all of X 1 , X 2 and Y 1 are fluorine atoms.

3. The coating composition according to claim 1 , wherein the content of the fluorinated polymer in the coating composition is from 1 to 25 mass %.

4. The coating composition according to claim 1 , wherein CX 1 X 2 in the fluorinated polymer is equal to CX 3 X 4 in the fluorinated compound.

5. The coating composition according to claim 1 , wherein CY 1 in the fluorinated polymer is equal to CY 2 in the fluorinated compound.

6. The coating composition according to claim 1 , wherein COOM 1 in the fluorinated polymer is equal to COOM 2 in the fluorinated compound.

7. The coating composition according to claim 1 , wherein Rf 1 in the fluorinated polymer is equal to Rf 2 in the fluorinated compound.

8. The coating composition according to claim 1 , further comprising an additional polymer different from the fluorinated polymer, and wherein the content of the additional polymer in the coating composition is from 1 to 50 mass % based on the total amount of the fluorinated polymer and the additional polymer.

9. A process for producing a photoresist laminate having an antireflection coating layer provided on the surface of a photoresist layer, comprising:

applying a coating liquid which comprises the coating composition as defined in claim 8 and in which the total content of the fluorinated polymer and the additional polymer is from 1 to 10 mass %, to the surface of the photoresist layer; and

drying the coating liquid to form the antireflection coating layer.

10. The coating composition according to claim 1 , further comprising a solvent.

11. A process for producing a photoresist laminate having an antireflection coating layer provided on the surface of a photoresist layer, comprising:

applying a coating liquid which comprises the coating composition as defined in claim 1 and in which the content of the fluorinated polymer is from 1 to 10 mass %, to the surface of the photoresist layer; and

drying the coating liquid to form the antireflection coating layer.