Photosensor and display device having the same

1. A photosensor comprising:

a first light-shielding layer provided on an insulating surface;

a first insulating layer covering the first light-shielding layer;

a semiconductor layer provided on the first insulating layer, the semiconductor layer being connected to a first electrode and a second electrode, and the semiconductor layer configuring a diode;

a second insulating layer covering the semiconductor layer;

an opening provided in the second insulating layer so as to surround the semiconductor layer as viewed from a planar direction and the opening reaching at least the first insulating layer; and

a second light-shielding layer covering at least a side wall of the opening, wherein

the opening is provided in the second insulating layer and the first insulating layer to reach the first light-shielding layer, and

the second light-shielding layer covers at least the side wall of the opening and makes contact with the first light-shielding layer.

2. The photosensor according to claim 1 , wherein

the second light-shielding layer has a lower surface in the opening as viewed from a cross-sectional direction closer to the insulating surface rather than a lower surface of the semiconductor layer.

3. The photosensor according to claim 1 , wherein

the first electrode and the second electrode are provided to a layer that is the same as the second light-shielding layer.

4. The photosensor according to claim 1 , wherein

the semiconductor layer includes a P-type impurity region in contact with the first electrode, an N-type impurity region in contact with the second electrode, and an intrinsic region interposed between the P-type impurity region and the N-type impurity region.

5. The photosensor according to claim 4 , wherein

the first light-shielding layer is applied with a control potential having a potential difference with respect to the P-type impurity region or the N-type impurity region.

6. The photosensor according to claim 1 , further comprising:

a planarizing layer provided on the second light-shielding layer; and

a lens provided on the planarizing layer, wherein

the lens and the semiconductor layer overlap each other in a planar view.

7. The photosensor according to claim 1 , wherein

each of the first light-shielding layer and the second light-shielding layer is a metal layer.

8. A display device comprising:

a photosensor;

a transistor;

a planarizing layer; and

a light-emitting element, wherein

the photosensor comprises:

a first light-shielding layer provided on an insulating surface;

a first insulating layer covering the first light-shielding layer;

a semiconductor layer provided on the first insulating layer, the semiconductor layer being connected to a first electrode and a second electrode, and the semiconductor layer configuring a diode;

a second insulating layer covering the semiconductor layer;

an opening provided in the second insulating layer so as to surround the semiconductor layer as viewed from a planar direction and the opening reaching at least the first insulating layer; and

a second light-shielding layer filling the opening,

the transistor comprises another semiconductor layer that is the same as the semiconductor layer,

the light-emitting element is provided on the planarizing layer and electrically connected to the transistor,

the planarizing layer is provided on the second light-shielding layer, and

at least one of a gate electrode, a source electrode, or a drain electrode of the transistor is provided to a layer that is the same as the first light-shieling layer or the second light-shielding layer.

9. The display device according to claim 8 , further comprising:

a bank provided on the planarizing layer, and the bank partitioning the light-emitting element; and

a lens provided on the planarizing layer and overlapping the semiconductor layer of the photosensor as viewed from the planar direction, wherein

the bank and the lens are formed of a same material.

10. The display device according to claim 8 , wherein

the first electrode and the second electrode are provided to the same layer as the second light-shielding layer.

11. The display device according to claim 8 , wherein

the semiconductor layer includes a P-type impurity region in contact with the first electrode, an N-type impurity region in contact with the second electrode, and an intrinsic region interposed between the P-type impurity region and the N-type impurity region.

12. A photo detection circuit comprising:

a photosensor;

a transistor; and

a capacitor, wherein

the photosensor comprises:

a first light-shielding layer provided on a first insulating surface;

a first insulating layer covering the first light-shielding layer;

a first semiconductor layer provided on the first insulating layer;

the first semiconductor layer being connected to a first electrode and a second electrode, the first semiconductor layer configuring a first diode,

a second insulating layer covering the first semiconductor layer;

a first opening provided in the second insulating layer so as to surround the first semiconductor layer as viewed from a planar direction and the first opening reaching at least the first insulating layer; and

a second light-shielding layer covering at least a side wall of the first opening,

the transistor has an end connected to a node electrically connected to the first electrode or the second electrode, another end connected to a first ground, and a gate electrode connected to a reset signal line,

the gate electrode is configured to be applied with a reset signal via the reset signal line, and

the capacitor is connected between the node and the first ground and is connected in series to the photosensor via the node.

13. The photo detection circuit according to claim 12 , wherein

the first semiconductor layer includes a P-type impurity region in contact with the first electrode, an N-type impurity region in contact with the second electrode, and an intrinsic region interposed between the P-type impurity region and the N-type impurity region.

14. The photo detection circuit according to claim 13 , wherein

each of the first light-shielding layer and the second light-shielding layer is a metal layer.

15. The photo detection circuit according to claim 14 , wherein

the first light-shielding layer is applied with a control potential having a potential difference with respect to the P-type impurity region or the N-type impurity region.

16. The photo detection circuit according to claim 12 , further comprising a heat sensor, wherein

the heat sensor comprises:

a third light-shielding layer provided on a second insulating surface;

a third insulating layer covering the third light-shielding layer;

a second semiconductor layer provided on the third insulating layer, the second semiconductor layer being connected to a third electrode and a fourth electrode, and the second semiconductor layer configuring a second diode;

a fourth insulating layer covering the second semiconductor layer;

a second opening provided in the fourth insulating layer so as to surround the second semiconductor layer as viewed from the planar direction and the second opening reaching at least the third insulating layer;

a fourth light-shielding layer covering at least a side wall of the second opening; and

a light-shielding film overlapping above the second semiconductor layer,

wherein the heat sensor is connected between the node and a second ground and connected in series to the photosensor via the node.