IP Library Granted Patent US 10,693,116
Granted Patent B2
US 10,693,116 · App. 15/485,785 · Granted Jun 23, 2020

Porous separator for secondary battery and manufacturing method thereof

Inventors: Hye Jin Kim (Daejeon, KR); Won Sub Kwack (Daejeon, KR); Min Sang Park (Daejeon, KR)
Assignees: SK Innovation Co., Ltd.; SK IE Technology Co., Ltd.
H01M2/1686C23C16/40C23C16/45527C23C16/45553C23C16/45555H01M2/145H01M2/1646H01M2/1653H01M10/0525
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Quick Facts
Patent No.
US 10,693,116
App. No.
15/485,785
Granted
Jun 23, 2020
Kind
B2
Abstract

Provided is a porous separator for a secondary battery including an inorganic oxide layer formed on a porous substrate by an atomic layer deposition process, such that a thin separator having excellent heat stability, permeability and electrolyte impregnability may be provided by controlling specific conditions in the process and thicknesses of the inorganic oxide layers on a surface and inside of the porous separator.

Claims (14)

1. A porous separator comprising:

an inorganic oxide layer formed on a porous substrate having an average pore diameter of 30 to 45 nm by an atomic layer deposition process,

wherein a thickness of the inorganic oxide layer is decreased in a direction from a surface of the porous substrate to a center thereof, and the following Relational Equations I and II are satisfied:

8≤{(10 t s +t r )× C}/ 100  [Relational Equation I]

(t s is time (sec) for injecting a metal precursor, t r is time (sec) for injecting an oxidant, and C is the number of repetitions of the atomic layer deposition process)

T h /T s ≤0.80  [Relational Equation II]

(T s is a thickness (nm) of the inorganic oxide layer on a surface of the porous separator, T h is a thickness (nm) of the inorganic oxide layer formed in internal pores at a position corresponding to ½ of a total thickness of the porous separator in a direction from the surface of the porous separator to the center of the porous separator), and

wherein the thickness of the inorganic oxide layer on the surface is 15.25 nm≤T s ≤30.0 nm and wherein a gas permeability of the porous separator is less than or equal to 525 (sec/100 cc).

2. The porous separator of claim 1 , wherein the time (sec) for injecting a metal precursor is 0.1≤t s ≤20, and the time (sec) for injecting an oxidant is 0.5≤t r ≤30.

3. The porous separator of claim 2 , wherein the number of repetitions of the atomic layer deposition process is 35 to 160.

4. The porous separator of claim 1 , wherein the thickness (nm) of the inorganic oxide layer formed in internal pores at a position corresponding to ½ of a total thickness of the porous separator in a direction from the surface of the porous separator to the center of the porous separator is 1.0≤T b ≤15.

5. The porous separator of claim 1 , wherein the porous polymer substrate has a porosity of 50 to 70%.

6. The porous separator of claim 1 , wherein the inorganic oxide layer includes one or more selected from the group consisting of SrTiO 3 , SnO 2 , CeO 2 , MgO, NiO, CaO, ZnS, ZnOS, ZrO 2 , Y 2 O 3 , SiC, CeO 2 , MgO, WO 3 , Ta 2 O 5 , RuO 2 , NiO, BaTiO 3 , Pb(Zr, Ti)O 3 (PZT), HfO 2 , SrTiO 3 , NiO, ZrO 2 , Al 2 O 3 , SiO 2 , TiO 2 , and ZnO.

7. The porous separator of claim 1 , wherein the porous substrate has a thickness of 20 to 30 μm.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 9, 2019
From: SK INNOVATION CO., LTD.
To: SK INNOVATION CO., LTD.; SK IE TECHNOLOGY CO., LTD.
Reel/Frame 050007/0637 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 12, 2017
From: KIM, HYE JIN; KWACK, WON SUB; PARK, MIN SANG
To: SK INNOVATION CO., LTD.
Reel/Frame 041985/0065 →
Priority Claims (1)
KR 10-2016-0046321 · Apr 15, 2016 · national
Continuity (1)
Related Publication 20170301902A1 · Oct 19, 2017