Thermally enhanced semiconductor package and process for making the same
The present disclosure relates to a thermally enhanced semiconductor package, which includes a module substrate, a thinned flip chip die over the module substrate, a mold compound component, a thermally conductive film, and a thermally enhanced mold compound component. The mold compound component resides over the module substrate, surrounds the thinned flip chip die, and extends above an upper surface of the thinned flip chip die to form a cavity over the upper surface of the thinned flip chip die. The thermally conductive film resides over at least the upper surface of the thinned flip chip at the bottom of the cavity. The thermally enhanced mold compound component resides over at least a portion of the thermally conductive film to fill the cavity.
1. An apparatus comprising:
a module substrate having an upper surface;
a thinned flip chip die comprising:
a device layer comprising electronic components;
a dielectric layer over an upper surface of the device layer; and
a plurality of interconnects extending from a lower surface of the device layer and coupled to the upper surface of the module substrate;
a mold compound component residing over the upper surface of the module substrate, surrounding the thinned flip chip die, and extending above an upper surface of the thinned flip chip die to form a cavity over the upper surface of the thinned flip chip die, wherein the mold compound component is not over the thinned flip chip die;
a thermally conductive film residing over at least the upper surface of the thinned flip chip die at a bottom of the cavity; and
a thermally enhanced mold compound component residing over at least a portion of the thermally conductive film to fill the cavity.
2. The apparatus of claim 1 , wherein the thinned flip chip die is formed from a silicon on insulator (SOI) structure, wherein the device layer of the thinned flip chip die is formed from a silicon epitaxy layer of the SOI structure, and the dielectric layer of the thinned flip chip die is a buried oxide layer of the SOI structure.
3. The apparatus of claim 1 wherein the thermally conductive film has a higher thermal conductivity than the thermally enhanced mold compound component.
4. The apparatus of claim 1 wherein the thermally conductive film has a thermal conductivity between 5 w/m·k and 5000 w/m·k.
5. The apparatus of claim 1 wherein the thermally conductive film has a thickness between 0.1 μm to 100 μm.
6. The apparatus of claim 1 wherein the thermally conductive film is formed from chemical vapor deposition (CVD) diamond.
7. The apparatus of claim 6 wherein the thermally conductive film has a thickness greater than 1 μm.
8. The apparatus of claim 1 wherein the thermally conductive film is formed from boron nitride.
9. The apparatus of claim 8 wherein the thermally conductive film has a thickness between 5 μm and 10 μm.
10. The apparatus of claim 1 wherein the thermally conductive film is formed from one of a group consisting of aluminum nitride, alumina, and beryllium oxide.
11. The apparatus of claim 1 wherein the thermally enhanced mold compound component has a thermal conductivity between 2 w/m·k and 20 w/m·k.
12. The apparatus of claim 1 wherein the thermally conductive film resides over exposed surfaces of the cavity and over the mold compound component to thermally connect the module substrate.
13. The apparatus of claim 1 wherein the thermally enhanced mold compound component resides over an entirety of the thermally conductive film.
14. The apparatus of claim 13 further comprises a shielding structure that encapsulates the thermally enhanced mold compound component and is in contact with the module substrate.
15. The apparatus of claim 1 further comprising an underfilling layer residing between the mold compound component and the upper surface of the module substrate, and underfilling the thinned flip chip die between the lower surface of the device layer and the upper surface of the module substrate.
16. The apparatus of claim 15 wherein the underfilling layer is formed from a same material as the mold compound component.