IP Library Granted Patent US 10,083,998
Granted Patent B2
US 10,083,998 · App. 15/491,279 · Granted Sep 25, 2018

Exposure mask and method of manufacturing a substrate using the exposure mask

Inventors: Seung-Bo Shim (Asan-si, KR); Jun-Gi Kim (Seoul, KR); Yong-Jun Park (Yongin-si, KR); Yang-Ho Jung (Seoul, KR); Jin-Ho Ju (Seoul, KR)
Assignee: Samsung Display Co., Ltd.
H01L27/1288G03F1/22G03F1/38H01L27/124
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Quick Facts
Patent No.
US 10,083,998
App. No.
15/491,279
Granted
Sep 25, 2018
Kind
B2
Abstract

An exposure mask includes a first transmission portion, a second transmission portion, and a blocking portion. The first transmission portion is configured to, when illuminated with light, transmit the light at a first energy level. The first transmission portion is disposed in association with formation of a first contact hole in an underlying layer. The second transmission portion is configured to, when illuminated with the light, transmit the light at a second energy level. The second transmission portion is disposed in association with formation of a second contact hole in the underlying layer. The blocking portion is configured to block the light, and is disposed in association with a boundary region between a first region and a second region of the underlying layer. The second transmission portion is further configured to enable the second contact hole to be formed deeper into the underlying layer than the first contact hole.

Claims (13)

1. A display substrate comprising:

a base substrate;

a gate layer disposed on the base substrate;

a gate insulating layer disposed on the gate layer;

a source/drain layer disposed on the gate insulating layer;

an organic insulating layer disposed on the gate layer and the source/drain layer, and comprising a first contact hole exposing the source/drain layer and a second contact hole exposing the gate layer; and

a conductive electrode formed on the organic insulating layer and electrically connecting the source/drain layer with the gate layer through the first contact hole and the second contact hole,

wherein a size of the first contact hole is different from a size of the second contact hole.

2. The display substrate of claim 1 , wherein the size of the second contact hole is greater than the size of the first contact hole.

3. The display substrate of claim 1 , wherein an area where the second contact hole makes contact with the gate layer is greater than an area where the first contact hole makes contact with the source/drain layer.

4. The display substrate of claim 1 , wherein a depth of the second contact hole is greater than a depth of the first contact hole.

5. The display substrate of claim 1 , wherein a volume of the second contact hole is greater than a volume of the first contact hole.

6. The display substrate of claim 1 , wherein a length of the second contact hole is greater than a length of the first contact hole in a direction in which the first contact hole and the second contact hole are disposed.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 4, 2026
From: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
To: LONESTAR CRYSTAL DISPLAY LLC
Reel/Frame 074944/0730 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 21, 2022
From: SAMSUNG DISPLAY CO., LTD.
To: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
Reel/Frame 060778/0543 →
Priority Claims (1)
KR 10-2012-0134921 · Nov 27, 2012 · national
Continuity (2)
Continuation 13835314 · Mar 15, 2013
Related Publication 20170221937A1 · Aug 3, 2017