Laser diode chip
A laser diode chip is described. In an embodiment the laser diode chip includes an n-type semiconductor region, a p-type semiconductor region and an active layer arranged between the n-type semiconductor region and the p-type semiconductor region, wherein the active layer is in the form of a single quantum well structure. The single quantum well structure includes a quantum well layer, which is arranged between a first barrier layer and a second barrier layer, wherein the first barrier layer faces the n-type semiconductor region, and the second barrier layer faces the p-type semiconductor region. An electronic bandgap E QW of the quantum well layer is smaller than an electronic bandgap E B1 of the first barrier layer and smaller than an electronic bandgap E B2 of the second barrier layer, and the electronic bandgap E B1 of the first barrier layer is larger than the electronic bandgap E B2 of the second barrier layer.
1. A laser diode chip comprising:
an n-type semiconductor region;
a p-type semiconductor region; and
an active layer arranged between the n-type semiconductor region and the p-type semiconductor region, wherein the active layer is in the form of a single quantum well structure,
wherein the single quantum well structure comprises a quantum well layer arranged between a first barrier layer and a second barrier layer, wherein the first barrier layer faces the n-type semiconductor region, and the second barrier layer faces the p-type semiconductor region,
wherein an electronic bandgap EQW of the quantum well layer is smaller than an electronic bandgap EB1 of the first barrier layer and smaller than an electronic bandgap EB2 of the second barrier layer,
wherein the electronic bandgap EB1 of the first barrier layer is larger than the electronic bandgap EB2 of the second barrier layer,
wherein the second barrier layer comprises a plurality of sublayers, which have different bandgaps and/or different levels of dopant concentration, and
wherein, at a distance of at least 10 nm from the quantum well layer, none of the sublayers have a bandgap larger than a sublayer arranged closer to the quantum well layer.
2. The laser diode chip as claimed in claim 1 , wherein a difference between the electronic bandgaps of the first barrier layer and of the second barrier layer is given by EB1−EB2≥0.04 eV.
3. The laser diode chip as claimed in claim 2 , wherein the difference between the electronic bandgaps of the first barrier layer and of the second barrier layer is given by EB1−EB2≥0.1 eV.
4. The laser diode chip as claimed in claim 1 , wherein the first barrier layer and the second barrier layer each comprises InxAlyGa1−x−yN, where 0≤x≤1, 0≤y≤1 and x+y≤1.
5. The laser diode chip as claimed in claim 4 , wherein an aluminum content y of the first barrier layer is higher than an aluminum content y of the second barrier layer.
6. The laser diode chip as claimed in claim 4 , wherein an indium content x of the first barrier layer is lower than an indium content x of the second barrier layer.
7. The laser diode chip as claimed in claim 4 , wherein the first barrier layer comprises InxAlyGa1−x−yN, where 0≤x≤0.07, 0≤y≤0.1 and x+y≤1.
8. The laser diode chip as claimed in claim 4 , wherein the second barrier layer comprises InxAlyGa1−x−yN, where 0≤x≤0.1, 0≤y≤0.07 and x+y≤1.
9. The laser diode chip as claimed in claim 1 , wherein the first barrier layer has a thickness between 0.25 nm and 30 nm.
10. The laser diode chip as claimed in claim 1 , wherein the second barrier layer has a thickness of at least 10 nm.
11. The laser diode chip as claimed in claim 1 , wherein the first barrier layer is doped and the second barrier layer is undoped.
12. The laser diode chip as claimed in claim 1 , wherein a dopant concentration in the first barrier layer equals between 1*10 17 cm −3 and 3*10 19 cm −3 .
13. The laser diode chip as claimed in claim 1 , wherein the first barrier layer is an n-type layer.
14. The laser diode chip as claimed in claim 1 , wherein the single quantum well structure consist of the first barrier layer, the quantum well layer and the second barrier layer.