IP Library Granted Patent US 9,960,017
Granted Patent B2
US 9,960,017 · App. 15/510,448 · Granted May 1, 2018

Plasma gas jetting device

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Quick Facts
Patent No.
US 9,960,017
App. No.
15/510,448
Granted
May 1, 2018
Kind
B2
Abstract

Plasma gas is ejected from inner gas ejection ports that are formed in a downstream side housing, and nitrogen gas is supplied as protective gas to a protective gas source between a housing and a cover section. Nitrogen gas is sucked in accompanying exhaust from inner gas ejection ports of plasma gas, and is ejected from the outer gas ejection ports. In this case, since a layer of nitrogen gas is formed in the periphery of plasma gas, it is possible to make it difficult to bring the plasma gas into contact with air, and it is possible to make it difficult to react a reactive species such as a radical in the plasma gas, oxygen in the air, and the like.

Claims (43)

1. A plasma gas jetting device comprising:

a plasma gas generation and ejection section including

an inner housing including an upstream side housing and a downstream side housing which is attachable to and detachable from the upstream side housing,

a pair of electrodes,

a discharge space formed between the pair of electrodes,

a plasma gas passage including an upstream side passage formed in the upstream side housing, and a downstream side passage formed in the downstream side housing, and

an outer housing which covers the downstream side housing of the inner housing,

wherein the upstream side passage includes a passage, and a vertical passage extending vertically and connected to the passage, a first end of the upstream side passage being in fluid communication with the discharge space and a second end of the upstream side passage being an opening formed in a lower face of the upstream side housing,

wherein the downstream side passage includes an election passage extending vertically, a first end of the ejection passage being in fluid communication with the second end of the upstream side passage, and a second end of the ejection passage being an inner gas election port formed on a lower face of the downstream side housing and is open towards the outer housing,

wherein the downstream side passage includes a connection section extending horizontally, the connection section facing the second end of the upstream side passage and the first end of the ejection passage,

wherein plasma gas activated in the discharge space is ejected from the inner gas ejection port through the plasma gas passage,

wherein a protective gas chamber is formed between the downstream side housing of the inner housing and the outer housing,

wherein a protective gas supply section supplies protective gas to the protective gas chamber,

wherein an outer gas ejection port is provided on a bottom face of the outer housing, the outer gas ejection port being downstream of and aligned with the inner gas ejection port, and

wherein the plasma gas and the protective gas are exhausted from the outer gas ejection port and jetted on a treatment target object.

2. The plasma gas jetting device according to claim 1 ,

wherein an opening area of the outer gas ejection port is larger than an opening area of the inner gas ejection port.

3. The plasma gas jetting device according to claim 1 ,

wherein the protective gas supply section includes at least a pair of protective gas supply ports that are provided in side faces of the outer housing.

4. The plasma gas jetting device according to claim 1 ,

wherein the connection section of the downstream side passage is recessed and open to an upper face of the downstream side housing.

5. The plasma gas jetting device according to claim 1 ,

wherein the inner gas ejection port is concentric with the outer gas ejection port.

6. The plasma gas jetting device according to claim 3 ,

wherein the protective gas supply ports are formed above the inner gas ejection port in the side faces of the outer housing.

7. The plasma gas jetting device according to claim 4 ,

wherein the second end of the upstream side passage is respectively offset the first end of the ejection passage in an X or Y direction, and

wherein the second end of the ejection passage is aligned in a lengthwise direction of the outer gas ejection port.

8. A plasma gas jetting device comprising:

a plasma gas generation and ejection section including

an inner housing including an upstream side housing and a downstream side housing which is attachable to and detachable from the upstream side housing,

a pair of electrodes,

a discharge space formed between the pair of electrodes,

a plasma gas passage including an upstream side passage formed in the upstream side housing, and a downstream side passage formed in the downstream side housing, and

an outer housing which covers the downstream side housing of the inner housing,

wherein the upstream side passage includes a passage, and a vertical passage extending vertically and connected to the passage, a first end of the upstream side passage being in fluid communication with the discharge space and a second end of the upstream side passage being an opening formed in a lower face of the upstream side housing,

wherein the downstream side passage includes an election passage extending vertically, a first end of the ejection passage being in fluid communication with the second end of the upstream side passage, and a second end of the ejection passage being an inner gas election port formed on a lower face of the downstream side housing and is open towards the outer housing,

wherein the downstream side passage includes a connection section extending horizontally, the connection section facing the second end of the upstream side passage and the first end of the ejection passage,

wherein plasma gas activated in the discharge space is ejected from the inner gas ejection port through the plasma gas passage,

wherein a protective gas chamber is formed between the downstream side housing of the inner housing and the outer housing,

wherein a protective gas supply section supplies protective gas to the protective gas chamber in a reduced pressure region that is generated by exhaust of the plasma gas,

wherein an outer gas election port is provided on a bottom face of the outer housing, the outer gas election port being downstream of and aligned with the inner gas election port, and

wherein the plasma gas is ejected along with the protective gas from the outer gas ejection port by the protective gas coming together with the plasma gas as the plasma gas is elected, and jetted on a treatment target object.

Assignments (2)
CHANGE OF NAME Recorded Jul 19, 2018
From: FUJI MACHINE MFG. CO., LTD.
To: FUJI CORPORATION
Reel/Frame 046591/0109 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 10, 2017
From: IKEDO, TOSHIYUKI; JINDO, TAKAHIRO
To: FUJI MACHINE MFG. CO., LTD.
Reel/Frame 041540/0192 →