Nitride semiconductor light-emitting element
A nitride semiconductor light-emitting element includes at least an n-type nitride semiconductor layer, a light-emitting layer, and a p-type nitride semiconductor layer. A multilayer body is provided between the n-type nitride semiconductor layer and the light-emitting layer, having at least one stack of first and second semiconductor layers. The second semiconductor layer has a greater band-gap energy than the first semiconductor layer. The first and second semiconductor layers each have a thickness of more than 10 nm and 30 nm or less. In applications in which luminous efficiency at room temperature is a high priority, the first semiconductor layer has a thickness of more than 10 nm and 30 nm or less, the second semiconductor layer has a thickness of more than 10 nm and 40 nm or less, and the light-emitting layer has V-shaped recesses in cross-sectional view.
1. A nitride semiconductor light-emitting element comprising:
an n-type nitride semiconductor layer;
a light-emitting layer;
a p-type nitride semiconductor layer; and
a multilayer body between the n-type nitride semiconductor layer and the light-emitting layer, the multilayer body including at least one stack of a first semiconductor layer and a second semiconductor layer, wherein
an n-type impurity concentration of each of the first semiconductor layer and the second semiconductor layer in the multilayer body is 3×10 18 cm −3 or more and less than 1.1×10 19 cm −3 ,
the second semiconductor layer has a greater band-gap energy than the first semiconductor layer,
each of the first semiconductor layer and the second semiconductor layer has a thickness of more than 10 nm and 30 nm or less, and
each of the thickness of the first semiconductor layer and the thickness of the second semiconductor layer is not less than a thickness of any layer that constitutes the light-emitting layer.
2. A nitride semiconductor light-emitting element comprising:
an n-type nitride semiconductor layer;
a light-emitting layer;
a p-type nitride semiconductor layer; and
a multilayer body between the n-type nitride semiconductor layer and the light-emitting layer, the multilayer body including at least one stack of a first semiconductor layer and a second semiconductor layer,
an n-type impurity concentration of each of the first semiconductor layer and the second semiconductor layer in the multilayer body is 3×10 18 cm −3 or more and less than 1.1×10 19 cm −3 ,
the second semiconductor layer has a greater band-gap energy than the first semiconductor layer,
the first semiconductor layer has a thickness of more than 10 nm and 30 nm or less, and the second semiconductor layer has a thickness of more than 10 nm and 40 nm or less, and
the light-emitting layer includes a plurality of V-shaped recesses (V-pits) with sizes of 150 nm or more in a cross-sectional view.
3. The nitride semiconductor light-emitting element according to claim 2 , wherein the V-shaped recesses (V-pits) reach the multilayer body at a bottom of a V-shape thereof.
4. The nitride semiconductor light-emitting element according to claim 2 , wherein the V-shaped recesses (V-pits) are present as a large number of scattered cavities in plan view of a top portion of the light-emitting layer with a plane surface density of the V-shaped recesses (V-pits) being 1×10 8 /cm 2 or more.
5. The nitride semiconductor light-emitting element according to claim 1 , wherein the first semiconductor layer and the second semiconductor layer have equal n-type impurity concentrations.
6. The nitride semiconductor light-emitting element according to claim 1 , wherein:
an n-type buffer layer is provided between the multilayer body and the light-emitting layer; and
the n-type buffer layer between the multilayer body and the light-emitting layer is an Al x3 In y3 Ga 1-x3-y3 N (0≤x3<1 and 0≤y3<1) layer that contains an n-type impurity and lies in contact with the light-emitting layer.
7. The nitride semiconductor light-emitting element according to claim 1 , wherein:
an n-type buffer layer is provided between the n-type nitride semiconductor layer and the multilayer body; and
the n-type buffer layer between the n-type nitride semiconductor layer and the multilayer body is an Al s4 In t4 Ga 1-s4-t4 N (0≤s4<1 and 0≤t4<1) layer that contains an n-type impurity and lies in contact with the multilayer body.
8. The nitride semiconductor light-emitting element according to claim 7 , wherein the n-type buffer layer between the n-type nitride semiconductor layer and the multilayer body has an n-type impurity concentration equal to at least one of an n-type impurity concentration of the first semiconductor layer and an n-type impurity concentration of the second semiconductor layer.
9. The nitride semiconductor light-emitting element according to claim 2 , wherein the first semiconductor layer and the second semiconductor layer have equal n-type impurity concentrations.
10. The nitride semiconductor light-emitting element according to claim 2 , wherein:
an n-type buffer layer is provided between the multilayer body and the light-emitting layer; and
the n-type buffer layer between the multilayer body and the light-emitting layer is an Al x3 In y3 Ga 1-x3-y3 N (0≤x3<1 and 0≤y3<1) layer that contains an n-type impurity and lies in contact with the light-emitting layer.
11. The nitride semiconductor light-emitting element according to claim 2 , wherein:
an n-type buffer layer is provided between the n-type nitride semiconductor layer and the multilayer body; and
the n-type buffer layer between the n-type nitride semiconductor layer and the multilayer body is an Al s4 In t4 Ga 1-s4-t4 N (0≤s4<1 and 0≤t4<1) layer that contains an n-type impurity and lies in contact with the multilayer body.
12. The nitride semiconductor light-emitting element according to claim 11 , wherein the n-type buffer layer between the n-type nitride semiconductor layer and the multilayer body has an n-type impurity concentration equal to at least one of an n-type impurity concentration of the first semiconductor layer and an n-type impurity concentration of the second semiconductor layer.