Ni-based alloy tube
View Patent ↗A Ni-based alloy tube includes a base metal having a chemical composition consisting, by mass percent, of C: 0.15% or less, Si: 1.0% or less, Mn: 2.0% or less, P: 0.030% or less, S: 0.030% or less, Cr: 10.0 to 40.0%, Ni: 50.0 to 80.0%, Ti: 0.50% or less, Cu: 0.60% or less, Al: 0.20% or less, N: 0.20% or less, and the balance: Fe and impurities; and a low Cr content complex oxide film having a thickness of 25 nm or smaller at least on an inner surface of the base metal, wherein contents of Al, Ni, Si, Ti, and Cr in the film satisfy [at % Al/at % Cr≤2.00], [at % Ni/at % Cr≤1.40], and [(at % Si+at % Ti)/at % Cr≥0.10].
1. A Ni-based alloy tube comprising a base metal having a chemical composition consisting, by mass percent, of
C: 0.15% or less,
Si: 1.0% or less,
Mn: 2.0% or less,
P: 0.030% or less,
S: 0.030% or less,
Cr: 10.0 to 40.0%,
Ni: 50.0 to 80.0%,
Ti: 0.50% or less,
Cu: 0.60% or less,
Al: 0.20% or less,
N: 0.20% or less, and
the balance: Fe and impurities; and,
a low Cr content complex oxide film having a thickness of 25 nm or smaller at least on an inner surface of the base metal, wherein
contents of Al, Ni, Si, Ti, and Cr in the film satisfy following formulas (i) to (iii):
at % Al/at % Cr≤2.00 (i)
at % Ni/at % Cr≤1.40 (ii)
(at % Si+at % Ti)/at % Cr≥0.10 (iii)
where each symbol in the above formula denotes a ratio of a content (at %) of each element to components contained in the low Cr content complex oxide film except O, C, and N.
2. The Ni-based alloy tube according to claim 1 , wherein, in photoelectric polarization photometry performed on the low Cr content complex oxide film, a band gap b (eV) that appears within a range of 3.2 to 3.8 eV satisfies a following formula (iv):
3.60< b≤ 3.80 (iv).
3. The Ni-based alloy tube according to claim 1 , wherein the Ni-based alloy tube is used as a member for nuclear power plant.
4. The Ni-based alloy tube according to claim 2 , wherein the Ni-based alloy tube is used as a member for nuclear power plant.