Substrate on which multiple nanogaps are formed, and manufacturing method therefor

1. A substrate with multiple nano-gaps comprising: a substrate including protuberant structures formed to be spaced-apart on a surface of the substrate by plasma etching of a polymer substrate; a metal-containing thin layer continuously between the substrate including protuberant structures and an insulation layer; and metal-containing nanoparticles on the insulation layer, wherein the metal-containing nanoparticles have nano-gaps with other metal-containing nanoparticles and with the metal-containing thin layer, wherein the metal-containing nanoparticles on the protuberant structures have a spherical or elliptical shape, wherein an upper part of the protuberant structure has a larger radius of curvature than a lower part of the protuberant structure, wherein the metal-containing thin layer includes a Raman active material, and wherein the Raman active material has a first thickness on the substrate including protuberant structures and has a second thickness on an upper surface the protuberant structures.

2. A Raman spectroscopic device comprising

a light source;

the substrate of claim 1 ; and

a detector configured to detect Raman spectrum.

3. A substrate comprising multiple nano-gaps comprising: a substrate including protuberant structures formed to be spaced-apart from each other by plasma etching of a polymer substrate: metal-containing nanoparticles; and a continuous layer between the substrate including protuberant structures and metal-containing nanoparticles and comprising at least one inorganic material-containing thin layer, and at least one metal-containing thin layer, wherein the nano-gaps are between the metal-containing nanoparticles, and are between the metal-containing nanoparticles and the metal-containing thin layer, wherein the metal-containing nanoparticles on the protuberant structures have a spherical or elliptical shape, wherein an upper part of the protuberant structure has a larger radius of curvature than a lower part of the protuberant structure, wherein the metal-containing thin layer includes a Raman active material and wherein the Raman active material has a first thickness on the substrate including protuberant structures and has a second thickness on an upper surface the protuberant structures.

4. The substrate comprising multiple nano-gaps of claim 3 , wherein the continuous layer includes two metal-containing thin layers and an inorganic material-containing thin layer therebetween, and

wherein the nano-gaps are between the two metal-containing thin layers.

5. The substrate comprising multiple nano-gaps of claim 3 , wherein the continuous layer includes a first inorganic material-containing thin layer, a metal-containing thin layer, and a second inorganic material-containing thin layer.

6. The substrate comprising multiple nano-gaps of claim 3 , wherein the continuous layer includes a metal-containing thin layer and an inorganic material-containing thin layer.

7. A substrate comprising multiple nano-gaps comprising: a substrate including protuberant structures formed to be spaced-apart from each other by plasma etching of a polymer substrate; metal-containing nanoparticles on a surface of the substrate including protuberant structures; and a continuous layer underneath the metal-containing nanoparticles and comprising at least one inorganic material-containing thin layer and at least one metal-containing thin layer, wherein the nano-gaps are between the metal-containing nanoparticles, and are between the metal-containing nanoparticles and the metal-containing thin layer, wherein the metal-containing nanoparticles on the protuberant structures have a spherical or elliptical shape, wherein an upper part of the protuberant structure has a larger radius of curvature than a lower part of the protuberant structure, wherein the metal-containing thin layer includes a Raman active material, and wherein the Raman active material has a first thickness on the substrate including protuberant structures and has a second thickness on an upper surface the protuberant structures.

8. The substrate comprising multiple nano-gaps of claim 7 , wherein the continuous layer includes two metal-containing thin layers and inorganic material-containing thin layer therebetween, and

wherein the nano-gaps are between the two metal-containing thin layers.

9. The substrate comprising multiple nano-gaps of claim 7 , wherein the continuous layer includes a first inorganic material-containing thin layer, a metal-containing thin layer, and a second inorganic material-containing thin layer.

10. The substrate comprising multiple nano-gaps of claim 7 , wherein the continuous layer includes a metal-containing thin layer and an inorganic material-containing thin layer.

11. A substrate with inorganic-containing particles comprising: a substrate including protuberant structures formed to be spaced-apart from each other by plasma etching of a polymer substrate; inorganic-containing particles continuously on a surface of the substrate including protuberant structures; and metal-containing nanoparticles on the inorganic-containing particles, wherein the metal-containing nanoparticles have nano-gaps with at least one of (i) the metal-containing nanoparticles on the protuberant structures and (ii) the metal-containing nanoparticles on an area of the substrate without protuberant structures, wherein the inorganic-containing particles on the protuberant structures have a spherical or elliptical shape, wherein an upper part of the protuberant structure has a larger radius of curvature than a lower part of the protuberant structure, wherein the inorganic-containing particles are formed by vacuum depositing an inorganic material, and wherein inorganic-containing particles have a first thickness on the substrate including protuberant structures and has a second thickness on an upper surface the protuberant structures.

12. The substrate with inorganic-containing particles of claim 11 , wherein a material of the inorganic-containing particles is one selected from the group consisting of an oxide, a nitride, an oxynitride, a halide, and a sulfide of a metal chosen from Al, Ba, Be, Ca, Cr, Cu, Cd, Dy, Ga, Ge, Hf, In, Lu, MS, Mo, Ni, Rb, Sc, Si, Sn, Ta, Te, Ti, W, Zn, Zr, and Yb, and magnesium fluoride.

13. An inorganic material-grown substrate comprising: a substrate including protuberant structures formed to be spaced-apart from each other by plasma etching of a polymer substrate; an inorganic material-containing bar continuously along the protuberant structures-: metal-containing nanoparticles on the inorganic material-containing bar; a first inorganic material-containing layer on a surface of the substrate; and nano-gaps between the metal-containing nanoparticles, wherein inorganic containing particles on the protuberant structures have a spherical or elliptical shape, wherein an upper part of the protuberant structure has a larger radius of curvature than a lower part of the protuberant structure, wherein the inorganic material has a first thickness on the substrate including protuberant structures and has a second thickness on an upper surface the protuberant structures.