Optoelectronic component having stray radiation

1. An optoelectronic component comprising an active zone that generates electromagnetic radiation, wherein the electromagnetic radiation is guided in a guide plane, the electromagnetic radiation is output essentially in the guide plane, the active zone emits stray radiation laterally with respect to the guide plane, an electrical contact pad is provided, the electrical contact pad is arranged outside the guide plane, the contact pad is formed by a surface at least partially covered by a conductive layer, the surface has inclined partial faces, and the electrically conductive layer on at least a subset of the inclined faces of the contact pad is configured to be so thin that electromagnetic stray radiation is emitted via the subset of the inclined faces covered by the conductive layer.

2. The component as claimed in claim 1 , wherein the surface has an average roughness which is greater than 0.1 μm.

3. The component as claimed in claim 1 , wherein the surface has a mean roughness depth having roughness peaks greater than 1 μm.

4. The component as claimed in claim 1 , wherein the electrically conductive layer has at least one metal layer.

5. The component as claimed in claim 4 , wherein the metal includes at least one element selected from the group consisting of Au, Ag, Cu, Ti, Pt, Ni, Cr, Sn, In and Al.

6. The component as claimed in claim 1 , further comprising an electrically conductive substrate and a semiconductor layer structure, wherein the semiconductor layer structure is configured as an active zone, and the electrical contact pad is configured on the substrate.

7. The component as claimed in claim 6 , wherein the substrate is configured as a thinned substrate layer.

8. The component as claimed in claim 6 , wherein the substrate is formed from GaN or SiC.

9. The component as claimed in claim 1 , wherein the conductive layer has a layer thickness of less than 20 nm on at least a subset of the inclined faces of the surface, and the conductive layer has a thickness of 50 nm or greater in other areas of the surface.

10. The component as claimed in claim 1 , wherein the active zone has a spacing of less than 40 μm from the contact pad.

11. The component as claimed in claim 1 , wherein the component is configured in the form of a laser diode or a light-emitting diode.

12. The component as claimed in claim 1 , wherein the contact pad is configured on GaN or SiC.

13. The component as claimed in claim 1 , wherein the component has an n-terminal and a p-terminal, and the p-terminal is mounted on a carrier.

14. A method of producing an optoelectronic component having an active zone that generates electromagnetic radiation, the electromagnetic radiation is guided in a guide plane, comprising:

outputting the electromagnetic radiation in the guide plane, wherein the active zone emits stray radiation laterally with respect to the guide plane, with a contact pad, and the contact pad has a surface covered by an electrically conductive layer, arranging the contact pad outside the guide plane, the surface has an average roughness greater than 0.1 μm,

producing the surface by a mechanical and/or chemical removal method such that the surface has faces inclined with respect to the guide plane, and

configuring the electrically conductive layer on at least a subset of the inclined faces of the contact pad to be so thin that electromagnetic stray radiation may be emitted,

wherein the conductive layer is deposited on at least a subset of the inclined faces of the surface having layer thicknesses of less than 20 nm, and in other areas of the surface, the conductive layer is deposited having a thickness of 50 nm or greater.

15. The method as claimed in claim 14 , wherein the electrically conductive layer is deposited onto the surface by a directed deposition method.

16. The method as claimed in claim 14 , wherein the conductive layer is formed from a metal.

17. The method as claimed in claim 14 , wherein the conductive layer is deposited on at least a subset of the inclined faces of the surface having layer thicknesses of less than 20 nm, and in other areas of the surface, the conductive layer is deposited having a thickness of 50 nm or greater.

18. The component as claimed in claim 14 , wherein the conductive layer is deposited having a thickness of 200 nm or greater.

19. A method of testing an optoelectronic component having an active zone that generates electromagnetic radiation, the electromagnetic radiation is guided in a guide plane, the electromagnetic radiation is output essentially in the guide plane, the active zone emits stray radiation laterally with respect to the guide plane, with a contact pad, the contact pad has a surface covered by an electrically conductive layer, the contact pad is arranged outside the guide plane, the surface has an average roughness greater than 0.1 μm, the surface has faces inclined relative to the guide face, and the electrically conductive layer on at least a subset of the inclined faces of the surface is configured to be so thin that electromagnetic stray radiation is emitted, comprising measuring the electromagnetic radiation emitted via the subset of inclined faces covered by the electrically conductive layer, and evaluating the measured amount to assess a quality of the component.