Security device with a lens array comprising several etched colour patterns
A method for producing a security device ( 1 ) comprising a first colour pattern (A) visible along an associated viewing axis (Δα) and at least one second colour pattern (B) visible along an associated viewing axis (Δβ), comprising the following steps:—assembling an image layer ( 4 ) suitable for forming at least one colour pattern (A, B) by laser etching, on a support ( 3 ),—laser etching the first colour pattern (A) in the image layer ( 4 ), along the associated viewing axis (Δα) of same, in such a way that it can be seen through a lens array ( 7 ),—for each of said at least one second colour pattern (B), laser etching said at least one second colour pattern (A) in the image layer ( 4 ), along the associated viewing axis (Δβ) of same, in such a way that it can be seen through a lens array ( 7 ). A security device ( 1 ) obtained by said method.
1. A process for manufacturing a security device ( 1 ) comprising a first color pattern (A) that is visible along an associated viewing axis (Δα) and at least one second color pattern (B) that is visible along an associated viewing axis (Δβ), the process comprising:
assembling an image layer ( 4 ), able to form at least one color pattern (A, B) by laser etching, above a carrier ( 3 );
laser etching in the image layer ( 4 ) the first color pattern (A), along its associated viewing axis (Δα), in such a way that it may be seen through a lenticular array ( 7 ); and
for each of said at least one second color pattern (B), laser etching in the image layer ( 4 ) said at least one second color pattern (B), along its associated viewing axis (Δβ), in such a way that it may be seen through a lenticular array ( 7 ),
wherein the image layer ( 4 ) comprises a pixel matrix array ( 5 ), each pixel ( 8 ) comprising a plurality of sub-pixels, each sub-pixel ( 9 ) comprising a color and being able to be selectively activated or deactivated by means of a laser.
2. The process as claimed in claim 1 , also comprising a step of assembling a lenticular array ( 7 ) above the image layer ( 4 ).
3. The process as claimed in claim 2 , wherein an etching step is carried out in the absence of the lenticular array ( 7 ).
4. The process as claimed in claim 2 , wherein an etching step is carried out through the lenticular array ( 7 ).
5. The process as claimed in claim 2 , wherein the lenticular array ( 7 ) is cylindrical, spherical, pyramidal or polyhedral.
6. The process claim 2 , wherein the focal plane of the lenticular array ( 7 ) is placed as close as possible to the image layer ( 4 ).
7. The process as claimed in claim 2 , wherein the lenticular array ( 7 ) is insensitive to the laser.
8. The process as claimed in claim 2 , wherein a guard, that is insensitive to the laser, is arranged under the lenticular array ( 7 ), said guard having a thickness such that said guard includes any intersection between a viewing axis (Δα) and a viewing axis (Δβ).
9. The process as claimed in claim 1 , wherein the image layer ( 4 ) comprises a first matrix array of pixels, able to form the first color pattern (A), and at least one second matrix array of pixels, able to form the at least one second color pattern (B), said first and at least one second matrix arrays being interlaced.
10. The process as claimed in claim 1 , wherein the lenticular array ( 7 ) is cylindrical, and wherein the one or more matrix arrays are linear and of axis secant to the axis of the lenticular array.
11. The process as claimed in claim 10 , wherein the angle between the axis of the one or more matrix arrays and the axis of the lenticular array ( 7 ) is equal to 90°+/−45°.
12. The process as claimed in claim 1 , wherein the image layer ( 4 ) also comprises an upper masking layer ( 6 ), which is placed between the pixel matrix array ( 5 ) and the lenticular array ( 7 ), and which is sensitive to the laser, in order to be able to selectively deactivate a sub-pixel ( 9 ) by etching an upper mask ( 16 ) by means of the laser.
13. The process as claimed in claim 1 , wherein the image layer ( 4 ) also comprises a lower masking layer ( 11 ), which is placed between the pixel matrix array ( 5 ) and the carrier ( 3 ), and which is sensitive to the laser, in order to be able to selectively deactivate a sub-pixel ( 9 ) by etching a lower mask ( 17 ) by means of the laser.
14. The process as claimed in claim 1 , wherein a sub-pixel ( 9 ) is sensitive to the laser, in order to be able to be selectively activated/selectively deactivated, respectively.
15. The process as claimed in claim 1 , wherein the first color pattern (A) is different from said at least one second color pattern (B).
16. The process as claimed in claim 1 , wherein each of said at least one second color pattern (B) reproduces the first color pattern (A) spatially offset in order to simulate a movement of the pattern.
17. The process as claimed in claim 1 , wherein said at least one second color pattern (B) reproduces the first color pattern (A) with at least one different color in order to simulate a variation in color.
18. A security device ( 1 ) obtained via the process as claimed in claim 1 .
19. A process for manufacturing a security device ( 1 ) comprising a first color pattern (A) that is visible along an associated viewing axis (Δα) and at least one second color pattern (B) that is visible along an associated viewing axis (Δβ), the process comprising:
assembling an image layer ( 4 ), able to form at least one color pattern (A, B) by laser etching, above a carrier ( 3 );
laser etching in the image layer ( 4 ) the first color pattern (A), along its associated viewing axis (Δα), in such a way that it may be seen through a lenticular array ( 7 ); and
for each of said at least one second color pattern (B), laser etching in the image layer ( 4 ) said at least one second color pattern (B), along its associated viewing axis (Δβ), in such a way that it may be seen through a lenticular array ( 7 ), wherein each of said at least one second color pattern (B) reproduces the first color pattern (A) spatially offset in order to simulate a movement of the pattern.
20. A process for manufacturing a security device ( 1 ) comprising a first color pattern (A) that is visible along an associated viewing axis (Δα) and at least one second color pattern (B) that is visible along an associated viewing axis (Δβ), the process comprising:
assembling an image layer ( 4 ), able to form at least one color pattern (A, B) by laser etching, above a carrier ( 3 );
laser etching in the image layer ( 4 ) the first color pattern (A), along its associated viewing axis (Δα), in such a way that it may be seen through a lenticular array ( 7 ); and
for each of said at least one second color pattern (B), laser etching in the image layer ( 4 ) said at least one second color pattern (B), along its associated viewing axis (Δβ), in such a way that it may be seen through a lenticular array ( 7 ),
wherein said at least one second color pattern (B) reproduces the first color pattern (A) with at least one different color in order to simulate a variation in color.