IP Library Granted Patent US 10,377,861
Granted Patent B2
US 10,377,861 · App. 15/538,827 · Granted Aug 13, 2019

Polyetherimide compositions, articles made therefrom, and method of manufacture thereof

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,377,861
App. No.
15/538,827
Granted
Aug 13, 2019
Kind
B2
Abstract

A polyetherimide composition is disclosed including a polyetherimide sulfone having a glass transition temperature of 240 to 320 C, preferably 245 to 312 C, and a particulate, thermally conductive filler composition. A layer of the polyetherimide composition resists deformation as determined by IPC method TM-650 when subjected to a lead-free solder reflow process at a temperature of greater than or equal to 260 C, preferably 260 to 350 C. A layer including the polyetherimide composition further has a thermal conductivity of 2.5 to 15 W/mK, preferably 3 to 12 W/mK, as determined in accordance with ISO 22007-2:2008.

Claims (15)

1. A circuit assembly comprising

a polyetherimide dielectric layer comprising a polyetherimide composition comprising

a polyetherimide sulfone having a glass transition temperature of 240 to 320° C.; and

a particulate, thermally conductive filler composition comprising 30 to 50 wt. % boron nitride and 5 to 15 wt. % graphite, wherein weight percent is based on the total weight of the polyetherimide composition; and

a conductive metal layer disposed on the polyetherimide dielectric layer;

wherein the polyetherimide dielectric layer

resists deformation as determined by IPC method TM-650 when subjected to a lead-free solder reflow process at a temperature of greater than or equal to 260° C., and

the polyetherimide dielectric layer has a thermal conductivity of 2.5 to 15 W/mK as determined in accordance with ISO 22007-2:2008.

2. The circuit assembly of claim 1 , wherein the conductive metal layer is in the form of a circuit.

3. An article comprising the circuit assembly of claim 1 .

4. A method of preparing the circuit assembly of claim 1 , the method comprising

forming the polyetherimide dielectric layer;

laminating the polyetherimide dielectric layer to the conductive metal layer under heat and pressure; and

reflow-soldering an electronic component to the circuit assembly.

5. The method of claim 4 , wherein the forming comprises extruding the polyetherimide dielectric layer, three-dimensionally printing the polyetherimide dielectric layer, metal insert molding the polyetherimide dielectric layer, or multilayer film casting the polyetherimide dielectric layer.

Assignments (3)
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVE THE APPLICATION NUMBER 15039474 PREVIOUSLY RECORDED AT REEL: 054528 FRAME: 0467. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Mar 23, 2021
From: SABIC GLOBAL TECHNOLOGIES B.V.
To: SHPP GLOBAL TECHNOLOGIES B.V.
Reel/Frame 057453/0680 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 26, 2020
From: SABIC GLOBAL TECHNOLOGIES B.V.
To: SHPP GLOBAL TECHNOLOGIES B.V.
Reel/Frame 054528/0467 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 6, 2017
From: XU, CHEN; ZHOU, HAO; ZHAO, WEI
To: SABIC GLOBAL TECHNOLOGIES B.V.
Reel/Frame 042915/0124 →