Solar cell manufacturing method
In the present invention, a p-type silicon substrate is produced, a solution containing aluminum is misted, and the misted solution is sprayed onto the back surface of the p-type silicon substrate under non-vacuum to form a back surface passivation film made of the aluminum oxide film on the back surface of the p-type silicon substrate. Thereafter, a light irradiation processing in which an interface between the p-type silicon substrate and the back surface passivation film is irradiated with ultraviolet light is performed.
1. A method for manufacturing a solar cell comprising the steps of:
(a) producing a silicon substrate having a first main surface and a second main surface,
(b) misting a solution containing a metal element,
(c) spraying said misted solution onto the first main surface of said silicon substrate under non-vacuum to form a passivation film made of a metal oxide film on the first main surface of said silicon substrate,
(d) producing a solar cell structure using said silicon substrate having said passivation film formed thereon, and
(e) performing a light irradiation processing in which an interface between said passivation film and said first main surface of said silicon substrate is irradiated with a given light during fabrication of the solar cell, wherein
said step (d) includes (d-1) a step of forming a first electrode and a second electrode on a first main surface side and a second main surface side of said silicon substrate, respectively,
said step (d-1) includes a baking processing for baking at a given baking temperature,
said step (e) is performed after said step (d), and
said given light in said step (e) is one of:
light whose photon energy is 1.1 eV or more,
artificial solar light having an air mass of 1.5, and
ultraviolet light having a wavelength of 365 nm.
2. The method for manufacturing a solar cell according to claim 1 , wherein
said metal element is aluminum, and
said metal oxide film is aluminum oxide.
3. The method for manufacturing a solar cell according to claim 1 , wherein said silicon substrate is a silicon substrate in which a crystalline silicon being a constituent material has p-type conductivity.
4. The method for manufacturing a solar cell according to claim 1 , wherein said given light irradiated during fabrication of the solar cell in said step (e) is the light whose photon energy is 1.1 eV or more.
5. The method for manufacturing a solar cell according to claim 1 , wherein said given light irradiated during fabrication of the solar cell in said step (e) is the artificial solar light having the air mass of 1.5.
6. The method for manufacturing a solar cell according to claim 4 , wherein said given light irradiated during fabrication of the solar cell in said step (e) is the ultraviolet light having the wavelength of 365 nm.
7. The method for manufacturing a solar cell according to claim 6 , wherein an irradiation time of said ultraviolet light is 1 second or more.
8. The method for manufacturing a solar cell according to claim 1 , wherein said given baking temperature in said step (d-1) is 500° C. or higher.
9. The method for manufacturing a solar cell according to claim 1 , wherein step (e) is a constituent part of manufacturing the solar cell.