IP Library Granted Patent US 10,068,935
Granted Patent B2
US 10,068,935 · App. 15/545,413 · Granted Sep 4, 2018

Image lag free pixel

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Quick Facts
Patent No.
US 10,068,935
App. No.
15/545,413
Granted
Sep 4, 2018
Kind
B2
Abstract

A CMOS image sensor pixel ( 200 ) comprising a photosensitive element ( 101 ) for generating a charge in response to incident light; a plurality of charge storage elements ( 103 ); a plurality of transfer gates ( 102 ) for enabling the transfer of charge between the photosensitive element and an associated one of the charge storage elements; and one or more first electrical connections ( 201 ) for placing at least two of the plurality of charge storage elements in mutual electrical contact.

Claims (41)

1. A CMOS image sensor pixel comprising:

a photosensitive element for generating a charge in response to incident light;

a plurality of charge storage elements;

a plurality of transfer gates for enabling the transfer of charge between the photosensitive element and an associated one of the charge storage elements; and

one or more first electrical connections for placing at least two of the plurality of charge storage elements in mutual electrical contact.

2. The CMOS image sensor pixel according to claim 1 , wherein the one or more first electrical connections are ohmic connections within a conductive layer.

3. The CMOS image sensor pixel according to claim 1 , further comprising one or more second electrical connections for controlling the plurality of transfer gates.

4. The CMOS image sensor pixel according to claim 3 , wherein the plurality of transfer gates is connected in parallel.

5. The CMOS image sensor pixel according to claim 1 comprising four transfer gates placed within the perimeter of the photosensitive element and positioned such that the four transfer gates form the vertices of a parallelogram.

6. The CMOS image sensor pixel according to claim 1 , wherein the photosensitive element comprises a pinned photodiode.

7. The CMOS image sensor pixel according to claim 1 , wherein each charge storage element comprises a floating diffusion region.

8. The CMOS image sensor pixel according to claim 1 , further comprising:

a reset transistor;

an amplification transistor; and

a select transistor.

9. The CMOS image sensor pixel according to claim 8 , wherein the reset transistor, amplification transistor and select transistor are shared by at least two of the plurality of charge storage elements.

10. An image sensor comprising one or more CMOS image sensor pixels according to claim 1 .

11. A CMOS image sensor pixel comprising:

an arrangement of two or more photosensitive elements, each configured to generate a charge in response to incident light;

a plurality of charge storage elements;

a plurality of transfer gates for enabling the transfer of charge between each of the two or more photosensitive elements and an associated one of the charge storage elements, each transfer gate comprising a gate for controlling the state of the transfer gate in response to an applied voltage;

one or more first electrical connections for placing at least two of the plurality of charge storage elements in mutual electrical contact; and

one or more second electrical connections for placing the plurality of gates in mutual electrical contact.

12. The CMOS image sensor pixel according to claim 11 , wherein the one or more first electrical connections are ohmic connections within a conductive layer.

13. The CMOS image sensor pixel according to claim 11 , wherein the one or more second electrical connections are ohmic connections within a conductive layer.

14. The CMOS image sensor pixel according to claim 11 , wherein each photosensitive element comprises a pinned photodiode.

15. The CMOS image sensor pixel according to claim 11 , wherein each charge storage element comprises a floating diffusion region.

16. The CMOS image sensor pixel according to claim 11 , further comprising:

a reset transistor;

an amplification transistor; and

a select transistor.

17. The CMOS image sensor pixel according to claim 16 , wherein the reset transistor, amplification transistor and select transistor are shared by at least two of the plurality of charge storage elements.

18. The CMOS image sensor pixel according to claim 11 comprising 4 photosensitive elements arranged in a 2×2 configuration.

19. An image sensor comprising one or more CMOS image sensor pixels according to claim 11 .

20. A CMOS image sensor pixel comprising:

an arrangement of two or more photosensitive elements, each configured to generate a charge in response to incident light;

a plurality of charge storage elements;

a plurality of transfer gates for enabling the transfer of charge between each of the two or more photosensitive elements and an associated one of the charge storage elements;

one or more first electrical connections for placing at least two of the plurality of charge storage elements in mutual electrical contact; and

one or more second electrical connections for controlling the plurality of transfer gates in parallel.

21. The CMOS image sensor pixel according to claim 20 , further comprising a controller configured to control the plurality of transfer gates simultaneously.

Assignments (2)
CHANGE OF NAME Recorded Apr 22, 2019
From: X-FAB SEMICONDUCTOR FOUNDRIES AG
To: X-FAB SEMICONDUCTOR FOUNDRIES GMBH
Reel/Frame 048956/0454 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 6, 2017
From: GAEBLER, DANIEL; CAO, XUEZHOU
To: X-FAB SEMICONDUCTOR FOUNDRIES AG
Reel/Frame 043503/0988 →