Slide Component
In an embodiment, a slide component includes a circular ring-shaped stationary-side seal ring 5 fixed to a stationary side and a circular ring-shaped rotating-side seal ring 3 rotating with a rotating shaft 1 , and relatively rotates respective opposed sliding faces S of the stationary-side seal ring 5 and the rotating-side seal ring 3 , thereby sealing a sealed fluid present on one side in a radial direction of the sliding face relatively rotating and sliding, wherein the sealed fluid is a silicate containing fluid; and on at least either one sliding face of the stationary-side seal ring 5 and the rotating-side seal ring 3 , an amorphous carbon film 10 formed by using hydrocarbon gas not containing organosilicon compound gas in a plasma CVD method is laminated. The slide component can seal a silicate containing sealed fluid to which silicate is added.
1. A slide component which includes a circular ring-shaped stationary-side seal ring fixed to a stationary side and a circular ring-shaped rotating-side seal ring rotating with a rotating shaft, and relatively rotates respective opposed sliding faces of the stationary-side seal ring and the rotating-side seal ring, for sealing a sealed fluid containing silicate present on one side in a radial direction of the sliding faces relatively rotating and sliding, wherein:
at least either one of the sliding faces of the stationary-side seal ring and the rotating-side seal ring is coated with an amorphous carbon film containing 0.34 at % or less of silicon in a manner preventing deposition of a silicate component contained in the sealed fluid on the sliding faces.
2. The slide component according to claim 1 , wherein a base material of the stationary-side seal ring or the rotating-side seal ring is silicon carbide.
3. The slide component according to claim 1 , wherein the amorphous carbon film is a film formed from hydrocarbon gas containing no organosilicon compound gas by plasma CVD.
4. The slide component according to claim 2 , wherein the amorphous carbon film is a film formed from hydrocarbon gas containing no organosilicon compound gas by plasma CVD.