Clean Rooms Having Dilute Hydrogen Peroxide (DHP) Gas and Methods of Use Thereof
Provided are improved clean rooms having dilute hydrogen peroxide (DHP) gas that provides for antiseptic conditions. Also provided are DHP gas containing clean rooms that have reduced levels of volatile organic compounds (VOCs) and methods for preparing clean rooms having DHP gas.
1 . A clean room comprising dilute hydrogen peroxide (DHP) gas at a concentration of at least 0.05 parts per million (ppm) up to 10.0 ppm and 0.015 parts per million (ppm) ozone or less.
2 . (canceled)
3 . The clean room of claim 1 , wherein said clean room is an ISO 14644 class 1 clean room, an ISO 14644 class 2 clean room, an ISO 14644 class 3 clean room, an ISO 14644 class 4 clean room, an ISO 14644 class 5 clean room, an ISO 14644 class 6 clean room, an ISO 14644 class 7 clean room, or an ISO 14644 class 8 clean room.
4 . The clean room of claim 1 , wherein said clean room is a BS 5295 class 1 clean room, a BS 5295 class 2 clean room, a BS 5295 class 3 clean room, or a BS 5295 class 4 clean room.
5 . The clean room of claim 1 , wherein said clean room is an EU GMP grade A clean room, an EU GMP grade B clean room, an EU GMP grade C clean room, an EU GMP grade D clean room.
6 . The clean room of claim 1 , wherein said clean room is a modular clean room.
7 - 15 . (canceled)
16 . The clean room of claim 1 , wherein said makeup air system comprises one or more filters selected from a 30% ASHRAE filter, a 60% ASHRAE filter, or a 95% ASHRAE filter.
17 - 19 . (canceled)
20 . The clean room of claim 1 , wherein said clean room is a turbulent flow clean room.
21 . The clean room of claim 1 , wherein said clean room is a laminar flow clean room.
22 . The clean room of claim 1 , wherein said clean room comprising DHP gas is safe for continuous human occupation according to the Occupational Safety and Health Administration (OSHA), National Institute for Occupational Safety and Health (NIOSH), or American Conference of Industrial Hygienists (ACGIH) standards.
23 . The clean room of claim 1 , wherein said clean room is a pharmaceutical clean room.
24 . The clean room of claim 1 , wherein said clean room is a biopharmaceutical clean room.
25 . The clean room of claim 1 , wherein said clean room is a clean room for semiconductor manufacture.
26 . The clean room of claim 1 , wherein said clean room has reduced levels of airborne molecular contaminants.
27 . (canceled)
28 . The clean room of claim 1 , wherein the air change rate is between 1 and 360 air changes per hour (ACH).
29 . The clean room of claim 21 , wherein the average air velocity is between 0.005 m/s to 0.508 m/s.
30 - 38 . (canceled)
39 . The clean room of claim 1 , wherein said clean room comprises a biocontainment environment specified by the Centers for Disease Control and Prevention as biosafety level 1 (BSL-1), biosafety level 2 (BSL-2), biosafety level 3 (BSL-3), or biosafety level 4 (BSL-4).
40 - 51 . (canceled)
52 . A method of providing DHP gas at a concentration of at least 0.05 parts per million (ppm) to said clean room comprising installing a PHPG generating device comprising an air-permeable substrate structure having a catalyst on its surface, a source of light; and wherein air flows through said air-permeable substrate structure and the device produces PHPG and directs it away from said air-permeable substrate structure.
53 . The method of claim 52 , wherein said DHP gas produced by said PHPG generating device is free of hydration, ozone, plasma species, and organic species.
54 - 55 . (canceled)
56 . The method of claim 52 , wherein said DHP gas is not prepared from vaporized hydrogen peroxide liquid.
57 - 61 . (canceled)
62 . A method of reducing organic species adsorption-induced contamination during silicon wafer production comprising providing DHP gas at a concentration of at least 0.05 parts per million (ppm) to a silicon wafer production facility clean room.
63 . The method of claim 62 , wherein said organic species are selected from the group consisting of stearic acid, butylated hydroxy toluene, siloxane, 4-dodecylbenzenesulfonic acid, n-pentadecane, bis(2-ethylhexyl) benzene-1,2-dicarboxylate (DOP), 3,4-dibutylphthalic acid (DBP), diethylphthalate (DEP), tris(2-chloroethyl) phosphate (TCEP), triphenyl phosphate (TPP), triethyl phosphate (TEP), hexanedioate (DOA), 2,2-dibutylhexanedioic acid (DBA), and 2,6-ditert-butyl-4-methylphenol (BHT).
64 . (canceled)