Ceramic combo lid with selective and edge metallizations
A frame lid for use with a semiconductor package is disclosed. First, a mask is applied to a top surface of the lid and over a central area of the top surface to define a peripheral area. Next, a seal ring is formed by metallizing the peripheral area and the sidewall of the plate. The mask can then be removed obtain the frame lid. Next, a solder preform can be attached to the seal ring. This reduces pullback and shrinkage of the metallized layer, while lowering the manufacturing cost and process times.
1. A frame lid for a semiconductor package comprising:
a substrate comprising a top surface, a bottom surface, and a sidewall joining the top surface and the bottom surface together, wherein the substrate is glass or ceramic; and
at least one layer of metal is applied continuously from a peripheral area of the top surface and extending along the sidewall to the bottom surface of the substrate via sputter deposition, wherein a nickel sublayer is applied continuously from the peripheral area and extending along the sidewall to the bottom surface of the substrate via sputter deposition; and, a gold sublayer is applied via sputter deposition over the nickel sublayer.
2. The frame lid for a semiconductor package of claim 1 , wherein the layer of metal applied to the peripheral area and the sidewall of the substrate via sputter deposition has a thickness of about 1 micrometer to about 10 micrometers.
3. The frame lid for a semiconductor package of claim 1 , wherein the metal applied to the peripheral area and the sidewall of the substrate via sputter deposition has a thickness of about 1 micrometer to about 40 micrometers.
4. The frame lid for a semiconductor package of claim 1 , wherein there are three layers of metal applied to the peripheral area and the sidewall of the substrate via sputter deposition.
5. The frame lid of claim 1 , wherein the ceramic is selected from the group consisting of alumina (Al 2 O 3 ), beryllia (BeO), aluminum nitride (AlN), zirconia toughened alumina (ZTA), SiC, and Si 3 N 4 .