Nanoparticle carrier platform and methods for controlled release of subterranean well treatment additives
Nano-sized mixed metal oxide carriers capable of delivering a well treatment additive for a sustained or extended period of time in the environment of use, methods of making the nanoparticles, and uses thereof are described herein. The nanoparticles can have a formula of: A/[M x 1 M y 2 M z 3 ]O n H m where x is 0.03 to 3, y is 0.01 to 0.4, z is 0.01 to 0.4 and n and m are determined by the oxidation states of the other elements, and M 1 can be aluminum (Al), gallium (Ga), indium (In), or thallium (Tl). M 2 and M 3 are not the same and can be a Column 2 metal, Column 14 metal, or a transition metal. A is can be a treatment additive.
1. A method of treating a subterranean well formation or wellbore comprising injecting a composition into a wellbore, the wellbore intersecting a subterranean formation, wherein the composition comprises a nanoparticle having a formula of
A/[M 1 x M 2 y M 3 z ]O n H m
where M 1 , M 2 , and M 3 are in the crystal lattice structure of the nanoparticle and M 1 is a Column 13 element selected from the group consisting of aluminum (Al), gallium (Ga), indium (In), and thallium (Tl), M 2 and M 3 are each a Column 2 metal, a Column 14 metal, or a transition metal, with the proviso that M 2 and M 3 are different,
x is 0.03 to 3, y is 0.01 to 0.4, z is 0.01 to 0.4 and n and m are determined by the oxidation states of the metals M 1 , M 2 , and M 3 , and
A is a well treatment additive capable of being released from the nanoparticle.
2. The method of claim 1 , wherein treating is squeeze treating, continuous treating, or spear treating the subterranean well formation or wellbore.
3. The method of claim 1 wherein the well treatment additive is released from the nanoparticle over an extended period of time.
4. A method for producing a nanoparticle, the method comprising:
(a) obtaining an aqueous solution comprising an M 1 alkoxide, an M 2 salt or alkoxide, and an M 3 salt or alkoxide;
(b) precipitating from the aqueous solution a nanoparticle having M 1 , M 2 , and M 3 in the crystal lattice structure of the nanoparticle; and
(c) loading a well treatment additive into the nanoparticle, wherein the nanoparticle has a formula of
A/[M 1 x M 2 y M 3 z ]O n H m
where M 1 , M 2 , and M 3 are in the crystal lattice structure of the nanoparticle and M 1 is a Column 13 element selected from the group consisting of aluminum (Al), gallium (Ga), indium (In), and thallium (Tl), M 2 and M 3 are each a Column 2 metal, a Column 14 metal, or a transition metal, with the proviso that M 2 and M 3 are different,
x is 0.03 to 3, y is 0.01 to 0.4, z is 0.01 to 0.4 and n and m are determined by the oxidation states of the metals M 1 , M 2 , and M 3 , and
A is a well treatment additive capable of being released from the nanoparticle.
5. The method of claim 4 , wherein the precipitation step (b) comprises reducing the pH of the aqueous solution to precipitate the nanoparticle.
6. The method of claim 4 , wherein the precipitation step (b) comprises removing alkoxide from the aqueous solution to precipitate the nanoparticles, preferably at a temperature of 70° C. to 150° C. for 0.1 hours to 24 hours.
7. The method of claim 4 , wherein step (c) comprises contacting the nanoparticle with the well treatment additive to form a mixture and sonicating the mixture to form the nanoparticle having the well treatment additive loaded therein.
8. The method of claim 4 , wherein the aqueous solution in step (a) comprises 0.01 to 9 wt. % M 1 , 0.01 to 1 wt. % M 2 , 0.01 to 1 wt. % of M 3 .
9. The method of claim 8 , wherein the nanoparticle in step (c) contains at least 0.1 wt. % of the well treatment additive based on the total weight of loaded nanoparticle.
10. The method of claim 4 , wherein the M 1 salt or alkoxide is an aluminum alkoxide, preferably aluminum-tri-sec-butoxide, the M 2 salt is MgCl 2 , and M 3 salt is CaCl 2 .