Method for producing a semiconductor chip and semiconductor chip
A method for producing a semiconductor chip ( 100 ) is provided, in which, during a growth process for growing a first semiconductor layer ( 1 ), an inhomogeneous lateral temperature distribution is created along at least one direction of extent of the growing first semiconductor layer ( 1 ), such that a lateral variation of a material composition of the first semiconductor layer ( 1 ) is produced. A semiconductor chip ( 100 ) is additionally provided.
1. A method for producing a semiconductor chip, wherein, during a growth process for growing a first semiconductor layer, an inhomogeneous lateral temperature distribution is created along at least one direction of extent of the growing first semiconductor layer, such that a lateral variation of a material composition of the first semiconductor layer is produced, the lateral variation of the material composition comprising a gradient of a proportion of one or more constituents of the first semiconductor layer.
2. The method according to claim 1 , wherein the inhomogeneous lateral temperature distribution is selectively created, at least partly, by a locally varying light irradiation.
3. The method according to claim 2 , wherein the light irradiation comprises an irradiation with a laser.
4. The method according to claim 2 , wherein the light irradiation is varied locally by a light deflecting means and/or by a plurality of light sources that can be operated independently of one another, to create the inhomogeneous lateral temperature distribution.
5. The method according to claim 1 , wherein the inhomogeneous lateral temperature distribution is selectively created, at least partly, by a temperature distribution structure, which has at least one temperature distribution structure element, which effects a local increase or reduction of the temperature of the growing first semiconductor layer.
6. The method according to claim 5 , wherein the first semiconductor layer is grown on a growth substrate, and the temperature distribution structure is arranged on a side of the growth substrate that faces away from the first semiconductor layer.
7. The method according to claim 5 , wherein the first semiconductor layer is grown on a growth substrate, and the temperature distribution structure is arranged on a side of the growth substrate that faces toward the first semiconductor layer.
8. The method according to claim 5 , wherein the first semiconductor layer is grown on a growth substrate, and wherein the temperature distribution structure is arranged in direct contact with the growth substrate.
9. The method according to claim 5 , wherein the first semiconductor layer is grown on a growth substrate, and wherein, as viewed from the growth substrate, the temperature distribution structure is covered by a protective layer, and/or a protective layer is arranged between the temperature distribution structure and the growth substrate.
10. The method according to claim 5 , wherein the temperature distribution structure is embedded into a protective layer.
11. The method according to claim 5 , wherein the temperature distribution structure is embedded in a semiconductor layer and/or in a growth substrate.
12. The method according to claim 5 , wherein the temperature distribution structure remains in the finished semiconductor chip.
13. The method according to claim 5 , wherein the temperature distribution structure element has a material that absorbs electromagnetic radiation.
14. The method according to claim 5 , wherein the temperature distribution structure element has an elevation and/or a recess in a growth substrate.
15. The method according to claim 5 , wherein the temperature distribution structure element has a recess, in a growth substrate, arranged in which there is a thermal barrier material having a lesser thermal conductivity than the growth substrate.
16. The method according to claim 5 , wherein the temperature distribution structure element has an elevation, in a growth substrate, which effects a locally varying thermal coupling to a carrier, on which the growth substrate is arranged.
17. The method according to claim 1 , wherein the first semiconductor layer is at least a part of a waveguide layer and/or of an active layer.
18. The method according to claim 1 , wherein at least one second semiconductor layer is grown over the first semiconductor layer and a ridge waveguide is created in the second semiconductor layer.
19. The method according to claim 1 , wherein the first semiconductor layer is part of a semiconductor layer sequence having a plurality of semiconductor layers.
20. A semiconductor chip produced by means of a method according to claim 1 , having a first semiconductor layer that, along at least one direction of extent, has a lateral variation of a material composition resulting from a laterally varying temperature distribution during a growth process.
21. A method for producing a semiconductor chip, wherein, during a growth process for growing a first semiconductor layer, an inhomogeneous lateral temperature distribution is created along at least one direction of extent of the growing first semiconductor layer, such that a lateral variation of a material composition of the first semiconductor layer is produced,
wherein the inhomogeneous lateral temperature distribution is selectively created, at least partly, by a temperature distribution structure, which has at least one temperature distribution structure element, which effects a local increase or reduction of the temperature of the growing first semiconductor layer, and
wherein at least one of:
the first semiconductor layer is grown on a growth substrate, and the temperature distribution structure is arranged on a side of the growth substrate that faces away from the first semiconductor layer,
the temperature distribution structure is embedded into a protective layer,
the temperature distribution structure is embedded in a semiconductor layer and/or in a growth substrate,
the temperature distribution structure remains in the finished semiconductor chip, or
the temperature distribution structure element has a recess, in a growth substrate, arranged in which there is a thermal barrier material having a lesser thermal conductivity than the growth substrate.