SEMICONDUCTOR DEVICE
A semiconductor device is a semiconductor device in which one chip region is formed through divided exposure. An interlayer insulating film has a via and an interconnection trench in an element formation region and has a guard ring hole in a guard ring region. An interconnection conductive layer is formed in the via and the interconnection trench. A guard ring conductive layer is formed in the guard ring hole. A minimum dimension of a width of the guard ring conductive layer is greater than a minimum dimension of a width of the interconnection conductive layer in the via.
1 - 4 . (canceled)
5 . A semiconductor device having in one chip region, an element formation region and a guard ring region surrounding said element formation region, in which said one chip region is formed through divided exposure, comprising:
an interlayer insulating film having a guard ring hole extending to surround said element formation region in said guard ring region; and
a guard ring conductive layer burying said guard ring hole,
said guard ring conductive layer having first and second portions extending in directions different from each other in a plan view and having such a shape that said first and second portions intersect with each other.
6 . The semiconductor device according to claim 5 , wherein
an angle of intersection between said first and second portions in a plan view is greater than 0° and smaller than 180°.
7 . The semiconductor device according to claim 6 , wherein
said first and second portions are equal to each other in line width and said first and second portions are orthogonal to each other.
8 . The semiconductor device according to claim 6 , wherein
said first and second portions are different from each other in line width and said first and second portions are orthogonal to each other.
9 . The semiconductor device according to claim 6 , wherein
said first and second portions intersect obliquely with each other.