Display device and method of manufacturing display device

1. A display device comprising:

a display region arranged with a plurality of pixels; and a sealing layer covering the display region;

wherein

the plurality of pixels is arranged in a first direction and a second direction intersecting the first direction,

the sealing layer includes an insulation layer having a density pattern;

the density pattern is a pattern including a low density region and a high density region aligned in one direction of the first direction and the second direction;

the low density region has the insulation layer with a lower density than an average density within the display region of the insulation layer; and

the high density region has the insulation layer with a higher density than the average density.

2. The display device according to claim 1 , wherein the density pattern is a cyclical pattern.

3. The display device according to claim 1 , wherein a contained amount of hydrogen in the insulation layer within the high density region is 5 at % or more and 15 at % or less and a contained amount of hydrogen in the insulation layer within the low density region is 30 at % or more.

4. The display device according to claim 1 , wherein the sealing layer includes a second insulation layer stacked on the first insulation layer, the first insulation layer including a first density pattern and the second insulation layer including a second density pattern, and wherein the second density pattern is an inverted pattern of the first density pattern.

5. The display device according to claim 1 , wherein the density pattern has a band shape.

6. The display device according to claim 1 , wherein the insulation layer is a silicon nitride layer.

7. A manufacturing method of a display device comprising:

preparing an array substrate having flexibility and arranged with a plurality of pixels in a display region; and

forming an inorganic insulation layer covering the plurality of pixels using a roll coater;

wherein

the inorganic insulation layer is formed so that a density pattern is included having a low density region and a high density region;

the low density region has the inorganic insulation layer with a lower density than an average density within the display region of the inorganic insulation layer; and

the high density region has the inorganic insulation layer with a higher density than the average density.

8. The manufacturing method of a display device according to claim 7 , wherein the density pattern is a cyclical band shaped pattern.

9. The manufacturing method of a display device according to claim 7 , wherein a plasma CVD method is used for forming a film.

10. The manufacturing method of a display device according to claim 7 , wherein the inorganic insulation layer is silicon nitride.

11. A manufacturing method of a display device comprising:

preparing an array substrate arranged with a plurality of pixels in a display region; and

arranging the array substrate in a substrate support body having a temperature gradient having a certain pattern and forming an inorganic insulation layer above the plurality of pixels;

wherein

the inorganic insulation layer is formed so that a density pattern is included having a low density region and a high density region corresponding to the certain pattern;

the low density region has the inorganic insulation layer with a lower density than an average density within the display region of the inorganic insulation layer; and

the high density region has the inorganic insulation layer with a higher density than the average density.

12. The manufacturing method of a display device according to claim 11 , wherein the density pattern is a cyclical pattern.

13. The manufacturing method of a display device according to claim 11 , wherein a plasma CVD method is used for forming the inorganic insulation layer.

14. The manufacturing method of a display device according to claim 11 , wherein the inorganic insulation layer is formed by silicon nitride.