Process for manufacturing a packaged device, in particular a packaged micro-electro-mechanical sensor, having an accessible structure, such as a mems microphone and packaged device obtained thereby
In order to manufacture a packaged device, a die having a sensitive region is bonded to a support, and a packaging mass of moldable material is molded on the support so as to surround the die. During molding of the packaging mass, a chamber is formed, which faces the sensitive region and is connected to the outside environment. To this end, a sacrificial mass of material that may evaporate/sublimate is dispensed on the sensitive region; the packaging mass is molded on the sacrificial mass; a through hole is formed in the packaging mass to extend as far as the sacrificial mass; the sacrificial mass is evaporated/sublimated through the hole.
1. A process for manufacturing a packaged device, the process comprising:
bonding a first die to a support, the first die having a first surface and a sensitive region formed at the first surface;
forming a sacrificial mass of material on the sensitive region of the first die;
in a molding process, providing a molding material on the support and around the first die to form a molded packaging mass; and
forming a chamber between a surface of the molded packaging mass and the sensitive region by evaporating/sublimating the sacrificial mass through a hole in the packaging mass, the chamber being delimited by a surface of the molding material and the first surface of the first die, the surface of the molding material facing the first surface of the first die, the chamber being in fluid communication with an environment outside of the molded packaged device.
2. The process according to claim 1 , further comprising prior to forming the chamber, forming the hole in the molded packaging mass.
3. The process according to claim 2 , wherein, after dispensing the sacrificial mass and before the molding process, forming a barrier layer on the sacrificial mass.
4. The process according to claim 3 , wherein the barrier layer is a conductive material and forming the barrier layer comprises spraying or jetting the conductive material on the sacrificial mass.
5. The process according to claim 2 , wherein the sacrificial mass is a dispensable polymer.
6. The process according to claim 5 , wherein the dispensable polymer is includes at least one of naphthalene, cyclododecane, anthracene, pyrene, perylene, and zinc acetate.
7. The process according to claim 1 , further comprising:
electrically coupling first ends of connection wires to pads of the first die and second ends of the connection wires to at least one of the support and a second die bonded to the support; and
applying sealing regions on the electrical connection wires before the molding process.
8. A process comprising:
forming a sacrificial layer over a semiconductor die;
forming a barrier layer on the sacrificial layer;
in a molding process, providing a moldable material around barrier layer, the sacrificial layer, and the semiconductor die to form a molded packaging mass; and
removing the sacrificial layer to form a cavity that exposes an active surface of the semiconductor die, wherein the cavity is delimited by a surface of the barrier layer and a surface of the semiconductor die.
9. The process according to claim 8 , further comprising forming a through opening in the molded packaging mass prior to removing the sacrificial layer, wherein the sacrificial layer is removed through the through opening in the molded packaging mass.
10. The process according to claim 8 , further comprising electrically coupling the semiconductor die to a substrate by conductive wires prior to forming the sacrificial layer, wherein forming the sacrificial layer comprises forming the sacrificial layer around the semiconductor die and the conductive wires.
11. The process according to claim 8 , further comprising electrically coupling the semiconductor die to a substrate by conductive wires prior to forming the sacrificial layer, wherein forming the sacrificial layer comprises forming the sacrificial layer over the active surface of the semiconductor die and not over the conductive wires.
12. The process according to claim 8 , wherein removing the sacrificial layer comprises heating the sacrificial layer.
13. The process according to claim 12 , wherein heating the sacrificial layer causes the sacrificial layer to evaporate.
14. A process comprising:
coupling a semiconductor die to a substrate;
coupling a first end of a conductive wire to the semiconductor die and a second end of the conductive wire to the substrate;
forming a sacrificial layer on at least a portion of the semiconductor die and around the conductive wire;
in a molding process, providing moldable material around the sacrificial layer and the semiconductor die to form a molded packaging mass;
forming an opening in the molded packaging mass to expose the sacrificial layer; and
removing the sacrificial layer through the opening to form a cavity that exposes an active surface of the semiconductor die and the conductive wire.
15. The process according to claim 14 , wherein forming the sacrificial layer on at least the portion of the semiconductor die comprises forming the sacrificial layer on the active surface of the semiconductor die.
16. The process according to claim 14 , further comprising forming a barrier layer over the sacrificial layer prior to molding the molded packaging mass, wherein forming the opening in the molded packaging mass further includes forming an opening in the barrier layer.
17. The process according to claim 14 , wherein removing the sacrificial layer through the opening comprises heating the sacrificial layer to cause the sacrificial to evaporate through the opening.
18. The process according to claim 14 , wherein the sacrificial mass is a dispensable polymer that includes at least one of naphthalene, cyclododecane, anthracene, pyrene, perylene, and zinc acetate.