Reflective diffraction grating and fabrication method
A reflective diffraction grating and a fabrication method are provided. The reflective diffraction grating includes a substrate, a UV-absorbing layer, a grating layer having a binary surface-relief pattern formed therein, and a conforming reflective layer. Advantageously, the UV-absorbing layer absorbs light at a UV recording wavelength to minimize reflection thereof by the substrate during holographic patterning at the UV recording wavelength.
1. An apparatus comprising:
a substrate;
an ultraviolet (UV)-absorbing layer, configured as a single layer made of a UV-absorbing dielectric material and configured to absorb light at a UV recording wavelength,
the UV-absorbing dielectric layer being disposed directly on the substrate and separate from the substrate,
the UV-absorbing dielectric layer having a thickness of at least 1.2 μm, and
the UV-absorbing dielectric material configured to have a transmission intensity of less than 25% at the UV recording wavelength; and
a reflective grating disposed directly on the UV-absorbing dielectric material;
the UV recording wavelength being between 300 nm and 450 nm, and
the UV recording wavelength being different from an operating wavelength for the reflective grating.
2. The apparatus of claim 1 , wherein the UV-absorbing dielectric material that forms the UV-absorbing layer has an extinction coefficient of greater than about 0.025 at the UV recording wavelength.
3. The apparatus of claim 1 , wherein the reflective grating comprises a grating layer that is disposed over the UV-absorbing layer and a reflective layer that is disposed over the grating layer.
4. The apparatus of claim 3 , wherein the grating layer is patterned and an upper portion of the grating layer is etched to form a surface-relief pattern.
5. The apparatus of claim 4 , wherein the surface-relief pattern includes ridges separated by grooves or the surface-relief pattern is a binary surface-relief pattern.
6. The apparatus of claim 4 , wherein the reflective layer is a conforming reflective layer conforming to the surface-relief pattern.
7. The apparatus of claim 6 , further comprising:
an adhesion layer; and
a barrier layer,
wherein the adhesion layer and the barrier layer are located between the surface-relief pattern and the conforming reflective layer.
8. The apparatus of claim 7 , wherein the conforming reflective layer is formed of gold and the adhesion layer is formed of titanium.
9. The apparatus of claim 7 , wherein the barrier layer is formed of titanium nitride.
10. The apparatus of claim 6 , wherein the conforming reflective layer is formed of gold.
11. The apparatus of claim 1 , wherein the UV-absorbing layer is a continuous, unpatterned layer.
12. The apparatus of claim 1 , wherein the UV-absorbing dielectric material has an extinction coefficient configured to suppress recording of spurious gratings in the reflective grating.
13. The apparatus of claim 1 , wherein the thickness of the UV-absorbing dielectric layer is less than 2 μm.
14. A method of fabrication, the method comprising:
providing a substrate;
depositing an ultraviolet (UV)-absorbing layer, configured as a single layer made of a UV-absorbing dielectric material and for absorbing light at a UV recording wavelength to minimize reflection thereof,
the UV-absorbing dielectric layer having a thickness of at least 1.2 μm,
the UV-absorbing dielectric material having a transmission intensity of less than 25% at the UV recording wavelength,
the UV recording wavelength being between 300 nm and 450 nm, and
the UV-absorbing dielectric material being disposed directly on the substrate and separate from the substrate; and
forming a reflective grating directly on the UV-absorbing dielectric material,
the UV recording wavelength being different from an operating wavelength for the reflective grating.
15. The method of claim 14 , wherein the UV-absorbing dielectric material that forms the UV-absorbing layer has an extinction coefficient of greater than about 0.025 at the UV recording wavelength.
16. The method of claim 14 , wherein the reflective grating comprises a grating layer that is disposed over the UV-absorbing layer and a reflective layer that is disposed over the grating layer.
17. The method of claim 16 , wherein the grating layer is patterned and an upper portion of the grating layer is etched to form a surface-relief pattern.
18. The method of claim 17 , wherein the surface-relief pattern includes ridges separated by grooves or the surface-relief pattern is a binary surface-relief pattern.
19. The method of claim 17 , wherein the reflective layer is a conforming reflective layer conforming to the surface-relief pattern.
20. The method of claim 19 , further comprising:
depositing an adhesion layer over the surface-relief pattern; and
depositing a barrier layer over the adhesion layer,
wherein the adhesion layer and the barrier layer are located between the surface-relief pattern and the conforming reflective layer.
21. The method of claim 20 , wherein the conforming reflective layer is formed of gold and the adhesion layer is formed of titanium.
22. The method of claim 20 , wherein the barrier layer is formed of titanium nitride.
23. The method of claim 19 , wherein the conforming reflective layer is formed of gold.
24. The method of claim 14 , wherein the UV-absorbing layer is a continuous, unpatterned layer.
25. The method of claim 14 , wherein the UV-absorbing dielectric material has an extinction coefficient sufficient to suppress recording of spurious gratings in the reflective grating.