Systems, methods, and apparatus for production coatings of low-emissivity glass including a ternary alloy
Disclosed herein are systems, methods, and apparatus for forming low emissivity panels that may include a substrate and a reflective layer formed over the substrate. The low emissivity panels may further include a top dielectric layer formed over the reflective layer such that the reflective layer is formed between the top dielectric layer and the substrate. The top dielectric layer may include a ternary metal oxide, such as zinc tin aluminum oxide. The top dielectric layer may also include aluminum. The concentration of aluminum may be between about 1 atomic % and 15 atomic % or between about 2 atomic % and 10 atomic %. An atomic ratio of zinc to tin in the top dielectric layer may be between about 0.67 and about 1.5 or between about 0.9 and about 1.1.
1. A coated article comprising:
a glass substrate;
an infrared (IR) reflective layer comprising silver over at least the glass substrate, wherein the IR reflective layer comprising silver is located on and directly contacting a layer comprising zinc oxide;
a contact layer located on and directly contacting the IR reflecting layer comprising silver;
a dielectric layer formed over the IR reflective layer comprising silver and over the contact layer, so that the IR reflective layer is formed between at least the dielectric layer and the glass substrate,
wherein the dielectric layer comprises zinc tin aluminum oxide, wherein an atomic ratio of zinc to tin in the dielectric layer is from 0.67 to 1.5, and wherein the dielectric layer comprises between about 1 atomic % and 15 atomic % aluminum.
2. The coated article of claim 1 , wherein the dielectric layer is substantially amorphous.
3. The coated article of claim 1 , wherein an absorption coefficient of the dielectric layer is about 0 for a wavelength range of between about 400 nm and 2500 nm.
4. The coated article of claim 1 , wherein the contact layer is oxided and comprises nickel.
5. The coated article of claim 1 , wherein the contact layer comprises nickel.
6. The coated article of claim 5 , wherein the contact layer is in direct contact with the dielectric layer comprising zinc tin aluminum oxide.
7. The coated article of claim 1 , wherein the contact layer comprises nickel and titanium.
8. The coated article of claim 7 , wherein the contact layer is in direct contact with the dielectric layer comprising zinc tin aluminum oxide.
9. The coated article of claim 1 , further comprising a layer comprising silicon nitride that is in direct contact with the dielectric layer comprising zinc tin aluminum oxide.
10. The coated article of claim 1 , further comprising a dielectric layer comprising zinc oxide under and directly contacting the IR reflecting layer, wherein the dielectric layer comprising zinc oxide is between at least the IR reflecting layer and the glass substrate.
11. The coated article of claim 1 , wherein the atomic ratio of zinc to tin in the dielectric layer is from 0.9 to 1.1.
12. The coated article of claim 1 , wherein the dielectric layer comprises between about 2 atomic % and 10 atomic % aluminum.