Method of making insulated glass window units
Certain example embodiments of this invention relate to techniques for laser ablating/scribing peripheral edges of a coating (e.g., a low-emissivity, mirror, or other coating) on a glass or other substrate in a pre- or post-laminated assembly, pre- or post-assembled insulated glass unit, and/or other product, in order to slow or prevent corrosion of the coating. For example, a 1064 nm or other wavelength laser may be used to scribe lines into the metal and/or metallic layer(s) in a low-emissivity or other coating provided in an already-laminated or already-assembled insulated glass unit or other product, e.g., around its periphery. The scribe lines decrease electron mobility from the center of the coating to the environment and, thus, slow and sometimes even prevent the onset of electrochemical corrosion. Associated products, methods, and kits relating to same also are contemplated herein.
1. A method of making an insulated glass window unit (IG unit), the method comprising:
having an intermediate product, the intermediate product including first and second spaced apart glass substrates that are spaced apart from each other via at least a peripheral edge spacer, a gap being defined between the first and second glass substrates, the first glass substrate having thereon a multilayer coating, the multilayer coating including at least one metal-inclusive layer susceptible to corrosion;
wherein the multilayer coating comprises a bottom dielectric layer directly on the first glass substrate, the metal-inclusive layer being provided over at least the bottom dielectric layer on the first glass substrate; and
laser-scribing a line in the multilayer coating by exposing the intermediate product to a laser source in making the insulated glass window unit, the line having a width of 500-800 μm and creating at least a partial barrier to electron transport between first and second portions of the at least one metal-inclusive layer that are provided on opposing sides of the line to at least retard corrosion of the at least one metal-inclusive layer in the first portion, the first portion being closer than the second portion to a center of the at least one metal-inclusive layer,
performing the laser-scribing to dissolve a portion of the coating including the at least one metal-inclusive layer but excluding the bottom dielectric layer, so that after said laser scribing the line is provided in the metal-inclusive layer but not through the bottom dielectric layer of the multilayer coating.
2. The method of claim 1 , wherein the laser source is 1064 nm laser source.
3. The method of claim 1 , further comprising operating the laser source at a wavelength at which the second glass substrate is at least 90% transmissive.
4. The method of claim 1 , wherein the coating is a low-emissivity coating and the metal-inclusive layer is a layer comprising Ag.
5. The method of claim 4 , wherein the coating includes at least one layer comprising Ni, Cr, and/or Ti, the at least one layer comprising Ni, Cr, and/or Ti being formed on and in physical contact with the layer comprising Ag.
6. The method of claim 4 , wherein the layer comprising Ag is sandwiched between and in direct physical contact with first and second layers comprising Ni, Cr, and/or Ti.
7. The method of claim 4 , wherein the layer comprising Ag is formed on an in direct physical contact with a layer comprising zinc oxide.
8. The method of claim 1 , further comprising performing the laser-scribing to dissolve only a part of the coating proximate to the line.
9. The method of claim 1 , further comprising controlling heat generated by laser-scribing to avoid damaging the surface of the glass substrate on which the coating is formed.
10. The method of claim 9 , further comprising interrupting the laser-scribing and cooling the intermediate product and/or allowing the intermediate product to cool during the interruption, in order to assist in controlling the generated heat.
11. The method of claim 9 , further comprising controlling the duty cycle and/or operating power of the laser source in order to assist in controlling the generated heat.
12. The method of claim 1 , wherein the line is formed around a periphery of the intermediate product, the barrier being defined around the periphery of the intermediate product.
13. The method of claim 1 , wherein the laser-scribing is practiced in connection with multiple overlapping scans of the laser source.
14. The method of claim 1 , wherein the laser-scribing is performed to create a sub 10 pico-A electrical isolation barrier.
15. The method of claim 1 , wherein the second substrate is oriented closer to the laser source than is first substrate during the laser-scribing.
16. The method of claim 1 , wherein at least other ablated material of the metal-inclusive layer from the laser-scribing is absorbed into an adjacent material.
17. The method of claim 16 , wherein at least some other ablated material of the metal-inclusive layer from the laser-scribing re-forms in a non-conductive manner.
18. The method of claim 1 , wherein at least some other ablated material of the metal-inclusive layer from the laser-scribing re-forms in a non-conductive manner.