Manufacturing method for display device

1. A method of manufacturing an organic EL display device including a TFT formed on a substrate and an organic passivation film formed to cover the TFT, the method comprising:

coating a polyimide material;

curing the polyimide material to form the organic passivation film;

forming a first through hole in the organic passivation film;

annealing the organic passivation film at 250° C. to 300° C. for one hour or longer after forming the organic passivation film;

preheating the organic passivation film in a CVD device at a first temperature after the annealing;

heating the organic passivation film in the CVD device at a second temperature, the second temperature is higher than the first temperature;

depositing an intermediate film formed with SiO or SiN to directly cover and be in contact with the organic passivation film and an inner wall of the first through hole, in an environment at 200° C. to 300° C. by CVD after the heating in the CVD device, wherein the preheating the organic passivation film, the heating the organic passivation film, and the depositing the intermediate film are formed in the CVD device continuously without breaking vacuum environment;

forming a first electrode on the intermediate film;

forming a bank on the first electrode;

forming a second through hole in the bank to overlap the first electrode;

forming an organic EL film on the first electrode in the second through hole of the bank, and

forming a second electrode on the organic EL film.

2. The method of manufacturing an organic EL display device according to claim 1 , wherein the preheating and the heating are conducted in different chambers of the CVD device.

3. The method of manufacturing an organic EL display device according to claim 1 , wherein the preheating, the heating, and the depositing the intermediate film by the CVD are executed in different chambers within a same vacuum device.