Liquid crystal display device
The invention prevents the display unevenness of a high-resolution liquid crystal display device that results from the presence of regions where an alignment film is not applied. The invention provides a liquid crystal display device including: a TFT substrate having scan lines, video signal lines, and pixels formed by the intersecting scan lines and video signal lines; a counter substrate; and a liquid crystal layer placed between the TFT substrate and the counter substrate. Each of the pixels includes a TFT, a pixel electrode, a common electrode, and a through-hole and an opening that are used to connect the TFT and the pixel electrode. Connective ITO is formed in and around the through-hole at the same time as the common electrode is formed. A step d is formed at an edge portion of the connective ITO and covered with an alignment film.
1. A liquid crystal display device comprising:
a first substrate having a plurality of scan lines, a plurality of video signal lines, and pixels formed in areas surrounded by the plurality of scan lines and the plurality of video signal lines;
a second substrate; and
a liquid crystal layer sandwiched between the first substrate and the second substrate, wherein:
each of the pixels includes a switching element, a pixel electrode, a common electrode, and a through-hole formed in an insulating film located between the switching element and the pixel electrode;
a connection conductive layer is formed on an inner wall portion of the through-hole and in a through-hole surrounding area of the insulating film so as to electrically connect the pixel electrode and the switching element;
wherein the connection conductive layer formed in the through-hole surrounding area of the insulating film is formed around an opening area of the through-hole when viewed in a plan view,
the opening area of the through-hole has a first circumference,
the connection conductive area has a second circumference,
a width between the first circumference and the second circumference is substantially uniform around the opening area of the through-hole, and
a step is formed outside of an edge portion of the connection conductive layer in the through-hole surrounding area of the insulating film, the step being covered with an alignment film.
2. The liquid crystal display device of claim 1 , wherein the connection conductive layer is formed of indium tin oxide (ITO).
3. The liquid crystal display device of claim 2 , wherein the connection conductive layer is formed at the same time as the common electrode is formed.
4. The liquid crystal display device of claim 2 , wherein the connection conductive layer has a thickness of 100 nm or more.
5. The liquid crystal display device of claim 1 , wherein the connection conductive layer is formed of metal layer.
6. The liquid crystal display device of claim 5 , wherein the connection conductive layer has a thickness of 100 nm or more.
7. The liquid crystal display device of claim 1 , wherein the connection conductive layer is formed of a laminate of indium tin oxide (ITO) and a metal layer.
8. The liquid crystal display device of claim 7 , wherein the step has a height of 100 nm or more.
9. The liquid crystal display device of claim 1 , wherein:
the insulating film between the switching element and the pixel electrode is an organic passivation film;
a capacitor insulating film is formed on a liquid crystal layer side of the connection conductive layer to insulate the common electrode and the pixel electrode; and
the step is formed on the capacitor insulating film.