Method of manufacturing electronic device
According to one embodiment, a method of manufacturing an electronic device, includes preparing a first substrate including a first basement and a first conductive layer, and a second substrate includes a second basement and a second conductive layer, opposing the first conductive layer and spaced from the first conductive layer, providing a protection layer on the second substrate, forming a first hole penetrating the second substrate by irradiating the second substrate with a laser beam in a position overlapping the protection layer, removing the protection layer and forming a connecting material electrically connecting the first conductive layer and the second conductive layer to each other via the first hole after removing the protection layer.
1. A method of manufacturing an electronic device, comprising:
preparing a first substrate comprising a first basement and a first conductive layer, and a second substrate comprising a second basement and a second conductive layer, opposing the first conductive layer and spaced from the first conductive layer;
providing a protection layer on the second substrate;
forming a first hole penetrating the second substrate by irradiating the second substrate with a laser beam in a position overlapping the protection layer;
removing the protection layer;
forming a connecting material electrically connecting the first conductive layer and the second conductive layer to each other via the first hole after removing the protection layer, and
forming a protection member which covers the second conductive layer before the providing the protection layer, and forming the protection layer on the protection member, wherein
the protection layer is a film.
2. The method according to claim 1 , wherein
the providing of the protection layer comprises adhering the film on the second substrate.
3. The method according to claim 1 , wherein
the film contains polyethylene terephthalate.
4. The method according to claim 1 , wherein
an adhesion between the protection layer and the protection member is weaker than an adhesion between the protection member and the second conductive layer.
5. The method according to claim 1 , wherein
the protection layer contains an organic insulating material.
6. The method according to claim 5 , wherein
the providing the protection layer comprises applying the organic insulating material on the second substrate.
7. The method according to claim 5 , wherein
the organic insulating material contains an acrylic resin.
8. The method according to claim 1 , further comprising:
forming a second hole which penetrates the first conductive layer in a position opposing the first hole by irradiating the laser beam thereto.
9. The method according to claim 8 , further comprising:
forming a concavity in the first basement in a position opposing the second hole by irradiating the laser beam thereto.
10. The method according to claim 1 , wherein
the connecting material contains metal fine particles having a diameter of the order of from several nanometers to tens of nanometers.
11. The method according to claim 1 , wherein
the laser beam is a carbon dioxide gas laser beam.
12. The method according to claim 1 , further comprising:
forming a third hole which penetrates the protection layer by irradiating the laser beam on the second basement when forming the first hole.
13. The method according to claim 12 , wherein
the first hole and the third hole are circular in planer view and the first hole is circular concentric with the third hole.
14. The method according to claim 13 , wherein
a diameter of the third hole is greater than that of the first hole.
15. The method according to claim 14 , wherein
an upper surface of the second conductive layer is exposed from the third hole.