Semiconductor device
View Patent ↗A semiconductor device may include a semiconductor layer, an insulation gate section, and a first conductivity-type semiconductor region; wherein the semiconductor layer may include a vertical drift region being of a second conductivity type and disposed at the one of main surfaces; a body region being of the first conductivity type, adjoining the vertical drift region, and disposed at the one of main surfaces; and a source region being of the second conductivity type, separated from the vertical drift region by the body region, and disposed at the one of main surfaces, wherein the insulation gate section is opposed to a portion of the body region which separates the vertical drift region and the source region; and the first conductivity-type semiconductor region is opposed to at least a part of a portion of the vertical drift region which is disposed at the one of main surfaces.
1. A semiconductor device comprising:
a semiconductor layer having main surfaces, the semiconductor layer comprising:
a body region of a first conductivity type and disposed at one of the main surfaces;
a vertical drift region of a second conductivity type, adjoining the body region, and disposed at the one main surface; and
a source region of the second conductivity type, separated from the vertical drift region by the body region, and disposed at the one main surface;
an insulation gate section provided on a part of the one main surface, the insulation gate section being opposed to a portion of the body region which separates the vertical drift region and the source region; and
a first conductivity-type semiconductor region provided on another part of the one main surface, the first conductivity-type semiconductor region being opposed to at least a part of a portion of the vertical drift region which is disposed at the one main surface, and not provided between the source region and the vertical drift region.
2. The semiconductor device of claim 1 , wherein
the first conductivity-type semiconductor region is in contact with a part of the portion of the vertical drift region which is disposed at the one main surface, and is separated from the body region by the vertical drift region.
3. The semiconductor device of claim 1 , further comprising
a source electrode which covers the one main surface and is electrically connected to the source region,
wherein the first conductivity-type semiconductor region is electrically connected to the source electrode.
4. The semiconductor device of claim 1 , wherein
the first conductivity-type semiconductor region is electrically connected to a gate electrode of the insulation gate section.
5. The semiconductor device of claim 1 , wherein
the semiconductor layer is a silicon carbide semiconductor or a nitride semiconductor.