Light modulation for inspection probes
A probe system and a method are provided. The probe system includes an emitter unit, a pattern generation system, and an intensity modulator. The emitter unit is for emitting light. The pattern generation system is for projecting at least one reference structured-light pattern onto an object surface to obtain at least one reference projected pattern, and including a mirror scanning unit for reflecting the light to a plurality of directions. The intensity modulator is for modulating intensity of the light according to the at least one reference projected pattern to provide modulated light to the mirror scanning unit to reflect the modulated light to the plurality of directions to project at least one modulated structured-light pattern onto the object surface to obtain at least one modulated projected pattern.
1. A probe system, comprising:
a light source configured to emit a light point or a light line at a first intensity;
at least one mirror configured to tilt so as to reflect the light point or light line and form a projected light line or light area;
a diverging lens interposed between the light source and the at least one mirror, wherein the diverging lens is configured to receive the light point or light line from the light source and direct the light point or light line to the at least one mirror;
a grating positioned downstream from the at least one mirror so as to receive the projected light line or light area and to shadow the projected light line or light area to form at least one reference structured-light pattern;
a light sensor configured to sense light intensity of a projected pattern of light resulting from reflection of the at least one reference structured-light pattern from an object surface and to output image data in response to the sensed light intensity;
a microcontroller configured to:
receive the image data including the sensed light intensity of the projected pattern of light from the light sensor; and
determine the sensed light intensity of the projected pattern of light; and
output, when the sensed light intensity of the projected pattern of light is determined to be greater than an upper intensity value threshold or less than a lower intensity value threshold, one or more commands operative to adjust an intensity of the light point or light line from the first intensity to a second intensity such that the sensed light intensity of the projected pattern of light is adjusted to be between the upper intensity value threshold and the lower intensity value threshold.
2. The probe system of claim 1 , wherein the light source comprises one or more point light sources configured to emit one or more light points.
3. The probe system of claim 1 , wherein the light source comprises a line light source configured to emit a light line.
4. The probe system of claim 1 , further comprising an array of optical fibers configured to receive light emitted by the light source and generate a light line.
5. The probe system of claim 1 , wherein the at least one mirror is configured to tilt in two directions.
6. The probe system of claim 1 , wherein the at least one mirror is configured to tilt in one direction.
7. The probe system of claim 1 , wherein the at least one mirror comprises one or more micro electro mechanical systems mirror scanners.
8. A method, comprising:
emitting a light point or light line at a first intensity from a light source;
transmitting the light point or light line to a diverging lens;
reflecting the light point or light line received from the diverging lens at a plurality of directions to form a projected light line or light area;
receiving, by a grating, the projected light line or light area;
shadowing, by the grating, the projected light line or light area to form at least one reference structured-light pattern;
measuring light intensity of a projected pattern of light resulting from reflection of the at least one reference structured-light pattern from an object surface;
determining that the measured light intensity of the projected pattern is greater than an upper intensity value threshold or less than a lower intensity value threshold; and
modulating intensity of the light point or light line from the first intensity to a second intensity; and
reflecting the modulated light to the plurality of directions to form at least one modulated projected light line or light area; and
shadowing, by the grating, the modulated projected light line or light area to form at least one modulated structured-light pattern;
wherein the measured light intensity value of at least one modulated projected pattern resulting from reflection of the at least one modulated structured-light pattern onto the object surface is between the upper intensity value threshold and the lower intensity value threshold.
9. The method of claim 8 , wherein emitting light comprises emitting one or more light points.
10. The method of claim 8 , wherein emitting light comprises emitting a light line.
11. The method of claim 8 , wherein projecting at least one reference structured-light pattern comprises controlling one or more controllable mirrors to tilt in one-dimensional direction.
12. The method of claim 8 , wherein projecting at least one reference structured-light pattern comprises controlling one or more controllable mirrors to tilt in two-dimensional direction.
13. The probe system of claim 1 , wherein the microcontroller is further configured to output one or more commands operative to maintain the intensity of light emitted by the light source when the measured light intensity value of the predetermined region is between the upper intensity value threshold and the lower intensity value threshold.