IP Library Granted Patent US 10,845,666
Granted Patent B2
US 10,845,666 · App. 15/675,192 · Granted Nov 24, 2020

Electrochromic lithium nickel group 5 mixed metal oxides

Inventors: Hye Jin Choi (Berkeley, CA); Mark Bailey (Palo Alto, CA); John David Bass (San Francisco, CA); Stephen Winthrop von Kugelgen (Piedmont, CA); Eric Lachman (San Ramon, CA); Howard W. Turner (Campbell, CA)
Assignee: KINESTRAL TECHNOLOGIES, INC.
G02F1/1523Y10T428/265
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Quick Facts
Patent No.
US 10,845,666
App. No.
15/675,192
Granted
Nov 24, 2020
Kind
B2
Abstract

Multi-layer devices comprising a layer of an electrochromic lithium nickel oxide composition on a first substrate, the lithium nickel oxide composition comprising lithium, nickel and a Group 5 metal selected from niobium, tantalum and a combination thereof.

Claims (20)

1. A multi-layer device comprising a layer of a lithium nickel oxide composition on a first substrate, the lithium nickel oxide composition exhibiting long range ordering by X-ray diffraction analysis and comprising lithium, nickel, and at least one of niobium and tantalum.

2. The multi-layer device of claim 1 wherein the lithium nickel oxide composition exhibits long range ordering as measured by the presence of at least one reflection peak in the XRD pattern below 26 degrees (2θ) when measured with copper Ka radiation.

3. The multi-layer device of claim 1 wherein thelithium nickel oxide composition comprises tantalum.

4. The multi-layer device of claim 3 wherein (i) the atomic ratio of lithium to the combined amount of nickel and tantalum in the lithium nickel oxide composition is at least 0.4:1, respectively, and (ii) the atomic ratio of the amount of tantalum to the combined amount of nickel and tantalum in the lithium nickel oxide composition is about 0.025:1 to about 0.8:1, respectively.

5. The multi-layer device of claim 4 wherein the atomic ratio of lithium to the combined amount of nickel and tantalum in the lithium nickel oxide composition is in the range of about 0.75:1 to about 3:1, respectively.

6. The multi-layer device of claim 4 wherein the atomic ratio of tantalum to the combined amount of nickel and tantalum in the lithium nickel oxide composition is in the range of about 0.1:1 and about 0.6:1, respectively.

7. The multi-layer device of claim 1 wherein the lithium nickel oxide composition comprises niobium.

8. The multi-layer device of claim 1 wherein the atomic ratio of lithium to the combined amount of nickel and niobium in the lithium nickel oxide composition is at least 0.4:1, respectively, and (ii) the atomic ratio of the amount of niobium to the combined amount of nickel and niobium in the lithium nickel oxide composition is about 0.025: I to about 0.8:1, respectively.

9. The multi-layer device of claim 8 wherein the atomic ratio of lithium to the combined amount of nickel and niobium in the lithium nickel oxide composition is in the range of about 0.75:1 to about 3:1, respectively.

10. The multi-layer device of claim 8 wherein the atomic ratio of niobium to the combined amount of nickel and niobium in the lithium nickel oxide composition is in the range of about 0.1:1 and about 0.6:1, respectively.

11. The multi-layer device of claim 1 wherein (i) the atomic ratio of lithium to the combined amount of nickel, tantalum and niobium in the lithium nickel oxide composition is at least 0.4:1, respectively, and (ii) the atomic ratio of the combined amount of tantalum and niobium to the combined amount of nickel, tantalum, and niobium in the lithium nickel oxide composition is about 0.025:1 to about 0.8:1, respectively.

12. The multi-layer device of claim 11 wherein the atomic ratio of lithium to the combined amount of nickel, tantalum and niobium in the lithium nickel oxide composition is in the range of about 0.75:1 to about 3:1, respectively.

13. The multi-layer device of claim 11 wherein the atomic ratio of the combined amount of tantalum and niobium to the combined amount of nickel, tantalum and niobium in the lithium nickel oxide composition is in the range of about 0.1:1 and about 0.6:1, respectively.

14. The multi-layer device of claim 1 wherein (i) the lithium nickel oxide composition comprises at least one bleached state stabilizing element selected from the group consisting of Y, Ti, Zr, Hf, V, Mo, W, B, Al, Ga, In, Si, Ge, Sn, P, and Sb, (ii) the atomic ratio of lithium to the combined amount of nickel, tantalum, niobium and the bleached state stabilizing element(s) in the lithium nickel oxide composition is at least 0.4:1, respectively, and (iii) the atomic ratio of the combined amount of tantalum, niobium, and the bleached state stabilizing element(s) to the combined amount of nickel, tantalum, niobium, and the bleached state stabilizing elements in the lithium nickel oxide composition is about 0.025:1 to about 0.8:1, respectively.

15. The multi-layer device of claim 14 wherein the atomic ratio of lithium to the combined amount of nickel, tantalum, niobium, and the bleached state stabilizing element(s) in the lithium nickel oxide composition is in the range of about 0.75:1 to about 3:1, respectively.

16. The multi-layer device of claim 14 wherein the atomic ratio of the combined amount of tantalum, niobium, and the bleached state stabilizing elements to the combined amount of nickel, tantalum, niobium, and the bleached state stabilizing element(s) in the lithium nickel oxide composition is in the range of about 0.1:1 and about 0.6:1, respectively.

17. The multi-layer device of claim 1 wherein the lithium nickel oxide composition layer has an average thickness between 25 nm and 2,000 nm.

18. The multi-layer device of claim 1 wherein the first substrate comprises glass, plastic, metal, or metal-coated glass or plastic.

19. The multi-layer device of claim 1 wherein the multi-layer device further comprises a first transparent conductive oxide layer and the first transparent conductive oxide layer is between the lithium nickel oxide composition layer and the first substrate.

20. The multi-layer device of claim 1 wherein the lithium nickel oxide composition comprises at least 0.05 wt. % carbon.

Assignments (14)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 6, 2025
From: HALIO , LLC
To: SMART WINDOW INC., LIMITED
Reel/Frame 070438/0392 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 5, 2025
From: HALIO, INC.
To: HALIO, LLC
Reel/Frame 070404/0027 →
INTELLECTUAL PROPERTY SECURITY AGREEMENT Recorded Jun 18, 2024
From: HALIO, INC.
To: SKC CO., LTD., AS AGENT
Reel/Frame 067774/0328 →
SECURITY INTEREST Recorded Nov 17, 2023
From: HALIO, INC.
To: SKC CO., LTD., AS AGENT
Reel/Frame 065612/0158 →
RELEASE OF SECURITY INTEREST Recorded Oct 27, 2023
From: SK INC. (FORMERLY KNOWN AS SK HOLDINGS CO., LTD.)
To: HALIO, INC. (FORMERLY KNOWN AS KINESTRAL TECHNOLOGIES, INC.)
Reel/Frame 065383/0200 →
RELEASE OF SECURITY INTEREST Recorded Oct 27, 2023
From: SK INC.
To: HALIO, INC.
Reel/Frame 065382/0722 →
SECURITY INTEREST Recorded Sep 29, 2023
From: HALIO, INC.
To: PLUTUS CAPITAL NY, INC.
Reel/Frame 065084/0633 →
SECURITY INTEREST Recorded Aug 29, 2023
From: HALIO, INC.
To: PLUTUS CAPITAL NY, INC.
Reel/Frame 064753/0657 →
SECURITY INTEREST Recorded Nov 10, 2021
From: HALIO, INC.
To: SK INC.
Reel/Frame 058084/0947 →
CHANGE OF NAME Recorded Apr 1, 2021
From: KINESTRAL TECHNOLOGIES, INC.
To: HALIO, INC.
Reel/Frame 056031/0001 →
SECURITY INTEREST Recorded Jul 10, 2020
From: KINESTRAL TECHNOLOGIES, INC.
To: SK HOLDINGS CO., LTD.
Reel/Frame 053180/0686 →
RELEASE OF SECURITY INTEREST Recorded Jun 9, 2020
From: HORIZON TECHNOLOGY FINANCE CORPORATION
To: KINESTRAL TECHNOLOGIES, INC.
Reel/Frame 052887/0962 →
SECURITY INTEREST Recorded Nov 19, 2019
From: KINESTRAL TECHNOLOGIES, INC.
To: HORIZON TECHNOLOGY FINANCE CORPORATION
Reel/Frame 051059/0378 →
SECURITY INTEREST Recorded Jan 31, 2019
From: KINESTRAL TECHNOLOGIES, INC.
To: SK HOLDINGS CO., LTD.
Reel/Frame 048199/0113 →