Pellicle frame and pellicle
There is provided a pellicle frame which prevents particles such as carbon black particles or filler particles from contaminating a photomask even when stray light hits the inside face of the pellicle frame in the exposure step of photolithography. More specifically, provided are a pellicle frame including a frame base, and a polymer coating layer coating at least an inner circumferential surface of the frame base, the polymer coating layer including an outermost polymer layer on a side farthest away from the frame base and one or more inner polymer layers between the frame base and the outermost polymer layer, wherein at least one of the one or more inner polymer layers contains particles, and the outermost polymer layer contains no particles or has a particle concentration lower than a highest particle concentration among the one or more inner polymer layers; and a pellicle including the pellicle frame.
1. A pellicle frame comprising:
a frame base, and
a polymer coating layer coating at least an inner circumferential surface of the frame base, the polymer coating layer comprising an outermost polymer layer on a side farthest away from the frame base and one or more inner polymer layers between the frame base and the outermost polymer layer,
wherein at least one of the one or more inner polymer layers contains particles, and the outmost polymer layer contains no particles or has a particle concentration lower than a highest particle concentration among the one or more inner polymer layers.
2. The pellicle frame according to claim 1 , wherein the outermost polymer layer contains substantially no particles.
3. The pellicle frame according to claim 1 , wherein the particles are pigment particles and/or filler particles.
4. The pellicle frame according to claim 1 , wherein at least one of the inner polymer layers has a visible light transmittance of 50% or less.
5. The pellicle frame according to claim 1 , wherein the outermost polymer layer has a visible light transmittance of more than 50%.
6. The pellicle frame according to claim 1 , wherein the inner circumferential surface of the frame base coated with the polymer coating layer has an emissivity of 0.80 to 0.99.
7. The pellicle frame according to claim 1 , wherein each layer in the polymer coating layer contains the same polymer.
8. The pellicle frame according to claim 1 , wherein the outermost polymer layer has a thickness of 2 μm or more.
9. The pellicle frame according to claim 1 , wherein each layer in the polymer coating layer is formed by electrodeposition coating.
10. A pellicle comprising:
the pellicle frame according to claim 1 ;
a pellicle film provided over an upper end face of the pellicle frame; and
an adhesive applied on a lower end face of the pellicle frame.
11. A method for producing a pellicle frame, comprising the steps of:
subjecting at least an inner circumferential surface of a frame base to first electrodeposition coating with a mixture of a first polymer and first particles to form an inner polymer layer having a concentration A of the first particles; and
subjecting the inner polymer layer to second electrodeposition coating with a second polymer or with a mixture of a second polymer and second particles to form an outermost polymer layer, wherein the outermost polymer layer contains substantially none of the second particles or has a concentration of the second particles lower than the particle concentration A.
12. The method for producing a pellicle frame according to claim 11 , wherein each of the first electrodeposition coating and the second electrodeposition coating is anionic electrodeposition coating.