IP Library Granted Patent US 10,804,435
Granted Patent B2
US 10,804,435 · App. 15/686,314 · Granted Oct 13, 2020

Light-emitting device

Inventors: Chang-Tai Hisao (Hsinchu, TW); I-Lun Ma (Hsinchu, TW); Hao-Yu Chen (Hsinchu, TW); Shu-Fen Hu (Hsinchu, TW); Ru-Shi Liu (Hsinchu, TW); Chih-Ming Wang (Hsinchu, TW); Chun-Yuan Chen (Hsinchu, TW); Yih-Hua Renn (Hsinchu, TW); Chien-Hsin Wang (Hsinchu, TW); Yung-Hsiang Lin (Hsinchu, TW)
Assignee: EPISTAR CORPORATION
H01L33/42H01L33/32F21K9/232F21K9/237F21K9/238F21V5/04F21V29/77F21Y2115/10H01L33/06H01L33/44H01L2933/0016
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Quick Facts
Patent No.
US 10,804,435
App. No.
15/686,314
Granted
Oct 13, 2020
Kind
B2
Abstract

A light-emitting device includes a semiconductor stack including a first semiconductor layer, a second semiconductor layer, and an active layer emitting an UV light, formed between the first semiconductor layer and the second semiconductor layer; a first transparent conductive layer formed on the second semiconductor layer, the first transparent conductive layer including metal oxide; and a second transparent conductive layer formed on the first transparent conductive layer, the second transparent conductive layer including graphene, wherein the first transparent conductive layer is continuously formed over a top surface of the second semiconductor layer, the first transparent conductive layer comprises a thickness smaller than 10 nm.

Claims (22)

1. A light-emitting device, comprising:

a semiconductor stack comprising a first semiconductor layer, a second semiconductor layer, and an active layer formed between the first semiconductor layer and the second semiconductor layer, wherein the active layer is capable of emitting an UV light;

a first transparent conductive layer including metal or metal oxide formed on an upper surface of the second semiconductor layer;

a second transparent conductive layer including transparent conductive non-metal material formed on the first transparent conductive layer;

a contact layer between the second semiconductor layer and the first transparent conductive layer, wherein the second semiconductor layer comprises Al x Ga 1-x N, and the contact layer comprises Al y Ga 1-y N, 0<x, y≤1, and x>y; and

a first electrode formed on the first semiconductor layer and a second electrode formed on the second transparent conductive layer, wherein the second electrode is devoid of contacting the first transparent conductive layer from a cross-section of the light-emitting device, and wherein the first transparent conductive layer is continuously formed over the upper surface of the second semiconductor layer.

2. The light-emitting device of claim 1 , wherein the metal oxide comprises a work function between 4.5 eV and 7 eV.

3. The light-emitting device of claim 1 , wherein the metal oxide comprises a metal comprising a first oxidation state and a second oxidation state.

4. The light-emitting device of claim 1 , wherein the UV light comprises a wavelength between 100 and 290 nm.

5. The light-emitting device of claim 1 , wherein the second semiconductor layer comprises Al x Ga 1-x N, 0.55<x<0.65 and the contact layer comprises Al y Ga 1-y N, 0.05<y<0.1.

6. The light-emitting device of claim 1 , wherein the first transparent conductive layer comprises a sheet resistance larger than a sheet resistance of the second transparent conductive layer.

7. The light-emitting device of claim 1 , wherein the second transparent conductive layer comprises a plurality of sub-layers.

8. The light-emitting device of claim 1 , wherein the transparent conductive non-metal material comprises carbon.

9. The light-emitting device of claim 1 , wherein the transparent conductive non-metal material comprises graphene.

10. The light-emitting device of claim 1 , wherein the contact layer comprises p-type dopant, and a dopant concentration of the p-type dopant is between 1*10 19 cm −3 and 8*10 19 cm −3 .

11. The light-emitting device of claim 1 , wherein the first transparent conductive layer comprises a thickness deviation in a range between 5 nm and 2 nm.

12. The light-emitting device of claim 1 , wherein the contact layer comprises p-type dopants, and a dopant concentration of the p-type dopant is between 1*10 20 cm −3 and 2*10 20 cm −3 .

13. The light-emitting device of claim 1 , wherein the second electrode contacts the second transparent conductive layer.

14. The light-emitting device of claim 1 , wherein 0.01≤y≤0.1.

15. The light-emitting device of claim 1 , wherein the contact layer comprises a thickness between 50 Å and 150 Å.

16. The light-emitting device of claim 1 , wherein the second semiconductor layer comprises a thickness between 250 Å and 1000 Å.

17. The light-emitting device of claim 1 , wherein the first transparent conductive layer comprises a thickness between 0.1 nm and 10 nm.

Assignments (2)
CHANGE OF NAME Recorded Feb 18, 2026
From: EPISTAR CORPORATION
To: ENNOSTAR CORPORATION
Reel/Frame 075171/0402 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 30, 2019
From: HISAO, CHANG-TAI; MA, I-LUN; CHEN, HAO-YU; HU, SHU-FEN; LIU, RU-SHI; WANG, CHIH-MING; CHEN, CHUN-YUAN; RENN, YIH-HUA; WANG, CHIEN-HSIN; LIN, YUNG-HSIANG
To: EPISTAR CORPORATION
Reel/Frame 049324/0398 →
Priority Claims (2)
TW 105127175 A · Aug 25, 2016 · national
TW 106123416 A · Jul 13, 2017 · national
Continuity (1)
Related Publication 20180062043A1 · Mar 1, 2018