EC devices with nanostructred thin film anodes
A method of manufacturing a thin film is provided. The method includes providing a plurality of crystalline anodic electrochromic particles, size-reducing the crystalline anodic electrochromic particles by grinding to produce crystalline hexagonal tungsten trioxide nanostructures, and coating the crystalline anodic electrochromic nanostructures onto a substrate to produce a thin film. An electrochromic multi-layer stack is also provided.
1. A method of manufacturing a thin film comprising:
providing a plurality of crystalline anodic electrochromic particles;
size-reducing the crystalline anodic electrochromic particles by grinding to produce crystalline anodic electrochromic nanostructures; and
coating the crystalline anodic electrochromic nanostructures onto a substrate to produce an electrochromic thin film;
wherein the crystalline anodic electrochromic nanostructures comprise an alkali metal oxide material.
2. The method of claim 1 , wherein the crystalline anodic electrochromic nanostructures comprise a lithium nickel metal oxide material.
3. The method of claim 2 , wherein the lithium nickel metal oxide material comprises Li, Ni, O, and at least one metal selected from the group consisting of Al, Ti, Zn, Nb, Mo, Sb, and Te.
4. The method of claim 2 , wherein the lithium nickel oxide material comprises Li x Ni (2−(4x/3)) (Sb y Nb 1−y ) (x/3) O 2 , wherein x is from 1 to 1.2 and y is from 0 to 0.5.
5. The method of claim 1 , wherein the crystalline anodic electrochromic nanostructures comprise Li, a first metal, a second metal, and O, wherein
the first metal is selected from the group consisting of Mn, Fe, Co, Ni, and Sn;
and the second metal is selected from the group consisting of P, B, Si, Ge, Sn, Sb and Te.
6. The method of claim 1 , wherein the crystalline anodic electrochromic particles are produced using a thermal treatment at a temperature greater than 600° C.
7. The method of claim 1 , wherein the electrochromic thin film does not include a binder material.
8. The method of claim 1 , wherein the substrate comprises a material with a softening point less than 600° C.
9. The method of claim 1 , wherein the substrate comprises a material with a softening point less than 300° C.
10. The method of claim 1 , wherein the electrochromic thin film is an electrochromic anode layer in an electrochromic device.
11. An electrochromic multi-layer stack comprising:
an electrochromic anode layer comprising crystalline anodic electrochromic nanostructures;
an electrically conductive layer; and
an outer substrate;
wherein:
the multi-layer stack is incorporated into an electrochromic device;
the electrochromic anode layer does not include a binder;
the crystalline anodic electrochromic nanostructures comprise an alkali metal oxide material;
the crystalline anodic electrochromic nanostructures comprise a lithium nickel metal oxide material; and
the lithium nickel oxide material comprises Li x Ni (2−(4x/3)) (Sb y Nb 1−y ) (x/3) O 2 , wherein x is from 1 to 1.2 and y is from 0 to 0.5.
12. The electrochromic multi-layer stack of claim 11 , wherein the transparent substrate comprises a material with a softening point less than 600° C.
13. The electrochromic multi-layer stack of claim 11 , wherein the transparent substrate comprises a material with a softening point less than 300° C.
14. The electrochromic device of claim 11 , wherein the electrochromic device comprises a clear state and a dark state, wherein
the clear state comprises a CIE-Lab L* in transmission from 50 to 95, b* in transmission from −8 to 8, and a* in transmission from −4 to 4; and
the dark state comprises a CIE-Lab L* in transmission from 0 to 30, b* in transmission from −5 to −2, and a* in transmission from −7 to −5.