High efficiency wide spectrum sensor
An optical sensor including a first material layer comprising at least a first material; a second material layer comprising at least a second material that is different from the first material, where a material bandgap of the first material is larger than a material bandgap of the second material; and a graded material layer arranged between the first material layer and the second material layer, the graded material layer comprising an alloy of at least the first material and the second material having compositions of the second material that vary along a direction that is from the first material to the second material.
1. An optical sensor comprising:
a first layer supported by a substrate, the first layer comprising germanium-silicon having a first strain, and the first layer having a first area;
a second layer supported by the substrate, the second layer comprising germanium-silicon having a second strain that is lower than the first strain, and the second layer having a second area that is larger than the first area;
a first circuitry supported by the substrate;
a second circuitry supported by the substrate;
a filter supported by the substrate; and
a lens supported by the substrate,
wherein, in a direction normal to a substrate surface:
the second circuitry is arranged between the substrate and the first circuitry;
the first circuitry is arranged between the second circuitry and the second layer;
the second layer is arranged between the first circuitry and the first layer; and
the first layer is arranged between the second layer and both the filter and the lens.
2. An optical sensor comprising:
a layer supported by a substrate and extending in a plane, the layer comprising a germanium-silicon portion having a strain and a dielectric portion surrounding the silicon-germanium portion in the plane of the layer;
a first circuitry supported by the substrate;
a second circuitry supported by the substrate;
a filter supported by the substrate; and
a lens supported by the substrate,
wherein, in a direction normal to a substrate surface:
the second circuitry is arranged between the substrate and the first circuitry;
the first circuitry is arranged between the second circuitry and the layer; and
the layer is arranged between the first circuitry and both the filter and the lens.
3. An optical sensor comprising:
a first layer supported by a substrate, the first layer comprising germanium-silicon having a first strain, and the first layer having a first area;
a second layer supported by the substrate, the second layer comprising germanium-silicon having a second strain that is lower than the first strain, and the second layer having a second area that is larger than the first area;
a first circuitry supported by the substrate;
a second circuitry supported by the substrate;
a filter supported by the substrate; and
a lens supported by the substrate,
wherein, in a direction normal to a substrate surface:
the first circuitry is arranged between the substrate and the first layer;
the first layer is arranged between the first circuitry and the second layer; and
the second layer is arranged between the first layer and the second circuitry.
4. The optical sensor of claim 3 , further comprising:
a filter supported by the substrate; and
a lens supported by the substrate,
wherein the second circuitry is arranged between the second layer and both the filter and the lens.