METHOD FOR PRODUCING ARTICLE WITH LOW REFLECTION FILM

1 - 8 . (canceled)

9 . A method for producing a substrate with a film having fine particles dispersed in a matrix comprising Si 01 , the method comprising:

preparing a coating composition comprising a dispersion medium (a), fine particles (b) dispersed in the dispersion medium (a), and a binder (c) which contains a hydrolyzate of an alkoxysilane and is dissolved or dispersed in the dispersion medium (a);

placing a substrate on an electrically conductive substrate;

spraying the coating composition onto the substrate from a nozzle tip of an electrostatic coating gun;

electrifying the coating composition in an atomized state, thereby attaching the coating composition to the substrate placed on the electrically conductive substrate; and

baking or drying the coating composition, thereby forming the substrate with the film.

10 . The method for producing a substrate with a film having fine particles dispersed in a matrix comprising SiO 2 according to claim 9 , wherein the dispersion medium (a) contains water.

11 . The method for producing a substrate with a film having fine particles dispersed in a matrix comprising SiO 2 according to claim 9 , wherein the coating composition further comprises an acid or alkali.

12 . The method for producing a substrate with a film having fine particles dispersed in a matrix comprising SiO 2 according to claim 9 , wherein a distance between the nozzle tip of the electrostatic coating gun and the substrate is from 150 to 450 nm during the spraying andlor the electrifying.

13 . The method for producing a substrate with a film having fine particles dispersed in a matrix comprising SiO 2 according to claim 9 , wherein an amount of the coating composition supplied to the electrostatic coating gun is from 40 to 600 mL/min during the spraying.

14 . The method for producing a substrate with a film having fine particles dispersed in a matrix comprising SiO 2 according to claim 9 , wherein a surface temperature of the substrate is from room temperature to 70° C. during the spraying and/or the electrifying.

15 . The method for producing a substrate with a film having fine particles dispersed in a matrix comprising SiO 2 according to claim 9 , wherein the coating composition further comprises an organic compound (d) having a polar group.

16 . The method for producing a substrate with a film having fine particles dispersed in a matrix comprising SiO 2 according to claim 15 , wherein the organic compound (d) suppresses agglomeration of the fine particles (b) by electrostatic attraction in the coating composition.

17 . The method for producing a substrate with a film having fine particles dispersed in a matrix comprising SiO 2 according to claim 16 , wherein the fine particles (b) comprises fine particles covered with the organic compound (d) on surfaces thereof.

18 . The method for producing a substrate with a film having fine particles dispersed in a matrix comprising SiO 2 according to claim 17 , wherein the organic compound (d) has a hydroxy group and/or a carbonyl group in its molecule.

19 . The method for producing a substrate with a film having fine particles dispersed in a matrix comprising SiO 2 according to claim 9 , wherein a mass ratio (fine particles/binder) of the fine particles (b) to the binder (c) is from 95/5 to 10/90.

20 . The method for producing a substrate with a film having fine particles dispersed in a matrix comprising SiO 2 according to claim 9 , wherein

a lowest reflectance ratio of the film in a wavelength range of from 300 to 1,200 nm is 1.0% or less and

a Haze value of the film is 0.5% or less.

21 . The method for producing a substrate with a film having fine particles dispersed in a matrix comprising SiO 2 according to claim 9 , wherein the substrate is glass.