Glass plate and manufacturing method thereof

1. A glass plate comprising:

a first surface provided with a first film; and

a second surface provided with a second film and opposite to the first surface,

wherein each of the first film and the second film includes mainly tin oxide and has a sheet resistance value of 20 Ω/□ or less,

wherein a film thickness of the first film is θ 1 nm, and a film thickness of the second film is θ 2 nm, and, in the glass plate, a haze value measured from the first surface side for a configuration provided with the first film only is H 1 (%), and a haze value measured from the second surface side for a configuration provided with the second film only is H 2 (%),

a value of θ 1 divided by H 1 (θ 1 /H 1 ) is 500 or more but 1200 or less, and

a value of θ 2 divided by H 2 (θ 2 /H 2 ) is 300 or more but 750 or less.

2. The glass plate according to claim 1 further comprising at least one of:

a first insulated undercoat layer between the first film and the first surface; and

a second insulated undercoat layer between the second film and the second surface.

3. The glass plate according to claim 1 ,

wherein at least one of the first film and the second film is consisting of a fluorine-doped tin oxide.

4. The glass plate according to claim 1 ,

wherein the glass plate has a transmittance of 70% or more.

5. The glass plate according to claim 1 ,

wherein the glass plate has an emissivity of 0.25 or less.

6. The glass plate according to claim 1 ,

wherein the glass plate is applied to a door of an oven or a reach-in door of a refrigerator.

7. The glass plate according to claim 1 ,

wherein the film thickness θ 1 of the first film is within a range from 300 nm to 550 nm, and,

wherein the film thickness θ 2 of the second film is within a range from 250 nm to 550 nm.

8. The glass plate according to claim 1 ,

wherein the film thickness θ 1 of the first film is within a range from 420 nm to 490 nm, and,

wherein the film thickness θ 2 of the second film is within a range from 310 nm to 490 nm.

9. The glass plate according to claim 1 ,

wherein the haze value H 1 is within a range of 0.2% to 1.0%, and

wherein the haze value H 2 is within a range of 0.2% to 1.5%.

10. The glass plate according to claim 1 ,

wherein the haze value H 1 is within a range of 0.4% to 0.8%, and

wherein the haze value H 2 is within a range of 0.4% to 1.0%.

11. The glass plate according to claim 1 ,

wherein sheet resistance value is 15 Ω/□ or less.

12. The glass plate according to claim 1 ,

wherein the glass plate is a soda lime glass made by a float method and the second surface contacted a melted tin bath.

13. A glass plate comprising:

a first surface provided with a first film; and

a second surface provided with a second film and opposite to the first surface,

wherein each of the first film and the second film includes mainly tin oxide and has a sheet resistance value of 20 Ω/□ or less,

wherein a film thickness of the first film is θ 1 nm, and a film thickness of the second film is θ 2 nm, and in the glass plate, a haze value measured from the first surface side for a configuration provided with the first film only is H 1 (%), and a haze value measured from the second surface side for a configuration provided with the second film only is H 2 (%),

a value of θ 1 divided by H 1 (θ 1 /H 1 ) is 500 or more but 1200 or less, and

a value of θ 2 divided by H 2 (θ 2 /H 2 ) is 300 or more but 750 or less,

wherein the film thickness θ 1 of the first film is within a range from 300 nm to 550 nm, and the film thickness θ 2 of the second film is within a range from 250 nm to 550 nm,

wherein the haze value H 1 is within a range of 0.4% to 0.8% and the haze value H 2 is within a range of 0.4% to 1.0%, and

wherein the glass plate is a soda lime glass made by a float method and the second surface contacted a melted tin bath.

14. A manufacturing method of a glass plate in which films are provided on first and second surfaces that face each other, respectively, the method comprising:

(i) forming, during manufacturing of a glass ribbon, a first film mainly including tin oxide, by a CVD method, on the first surface of the glass ribbon that is an opposite side to the second surface, the second surface contacting melted tin; and

(ii) forming, after cutting the glass ribbon, on the second surface, by a CVD method, a second film mainly including tin oxide,

wherein a film thickness of the first film is θ 1 nm, and a film thickness of the second film is θ 2 nm, and, in the glass plate obtained after the step (ii), a haze value measured from the first surface side for a configuration provided with the first film only is H 1 (%), and a haze value measured from the second surface side for a configuration provided with the second film only is H 2 (%),

a value of θ 1 divided by H 1 (θ 1 /H 1 ) is 500 or more but 1200 or less, and

a value of θ 2 divided by H 2 (θ 2 /H 2 ) is 300 or more but 750 or less.

15. The manufacturing method according to claim 14 further comprising

(iii) heating the glass plate at a temperature that is higher than a glass-transition temperature of the glass ribbon but lower than a softening temperature of the glass ribbon.

16. The manufacturing method according to claim 14 ,

wherein at least one of the first film and the second film is consisting of a fluorine-doped tin oxide.

17. The manufacturing method according to claim 14 ,

wherein, at the step (i), the first film, in which the film thickness θ 1 is within a range from 300 nm to 550 nm, is formed, and or alternatively

wherein, at the step (ii), the second film, in which the film thickness θ 2 is within a range from 250 nm to 550 nm, is formed.

18. The manufacturing method according to claim 14 ,

wherein the step (i) includes

forming a first undercoat layer; and

forming the first film on the first undercoat layer.

19. The manufacturing method according to claim 14 ,

wherein the step (ii) includes

forming a second undercoat layer; and

forming the second film on the second undercoat layer.

20. The manufacturing method according to claim 14 ,

wherein at the step (i), the first film having a sheet resistance value of 20 Ω/□ or less is obtained, and/or

wherein at the step (ii), the second film having a sheet resistance value of 20 Ω/□ or less is obtained.