Geometry vectorization for mask process correction
Various aspects include vectorization approaches for model-based mask proximity correction (MPC). In some cases, a computer-implemented method includes: assigning a set of vectors to geometry data describing at least one mask for forming an integrated circuit (IC); adjusting a statistical predictive model of the at least one mask based upon the set of vectors and the geometry data; predicting an adjustment to the at least one mask with the statistical predictive model; and adjusting instructions for forming the at least one mask in response to a predicted mask result of the statistical predictive model deviating from a target mask result for the at least one mask.
1. A computer-implemented method comprising:
assigning a set of vectors to geometry data describing at least one mask for forming an integrated circuit (IC),
wherein assigning the set of vectors to the geometry data includes assigning a vector to each edge of the at least one mask, the vector including edge information for a plurality of nearest edges in the at least one mask;
adjusting a statistical predictive model of the at least one mask based upon the set of vectors and the geometry data;
predicting an adjustment to the at least one mask with the statistical predictive model; and
adjusting instructions for forming the at least one mask in response to a predicted mask result of the statistical predictive model deviating from a target mask result for the at least one mask.
2. The computer-implemented method of claim 1 , wherein predicting the adjustment to the at least one mask is performed in a single run prior to adjusting the instructions for forming the at least one mask.
3. The computer-implemented method of claim 1 , wherein the instructions for forming the at least one mask further include mask data correction instructions for modifying the geometry data based on the predicted adjustment.
4. The computer-implemented method of claim 1 , wherein the set of vectors describe a fragmentation condition or a segmentation condition in the at least one mask.
5. The computer-implemented method of claim 1 , wherein the set of vectors include a rule of sign for resolving a conflict between conditions in the geometry data.
6. The computer-implemented method of claim 1 , wherein the set of vectors describe at least one of: a spacing between mask features and a width of mask features.
7. A computer program product comprising program code stored on a computer readable storage medium, which when executed by at least one computing device, causes the at least one computing device to perform actions including:
assigning a set of vectors to geometry data describing at least one mask for forming an integrated circuit (IC),
wherein the set of vectors includes a rule of sign for resolving a conflict between conditions in the geometry data;
adjusting a statistical predictive model of the at least one mask based upon the set of vectors and the geometry data;
predicting an adjustment to the at least one mask with the statistical predictive model; and
adjusting instructions for forming the at least one mask in response to a predicted mask result of the statistical predictive model deviating from a target mask result for the at least one mask.
8. The computer program product of claim 7 , wherein predicting the adjustment to the at least one mask is performed in a single run prior to adjusting the instructions for forming the at least one mask.
9. The computer program product of claim 7 , wherein the instructions for forming the at least one mask further include mask data correction instructions for modifying the geometry data based on the predicted adjustment.
10. The computer program product of claim 7 , wherein assigning the set of vectors to the geometry data includes assigning a vector to each edge of the at least one mask, the vector including edge information for a plurality of nearest edges in the at least one mask.
11. The computer program product of claim 7 , wherein the set of vectors describe a fragmentation condition or a segmentation condition in the at least one mask.
12. The computer program product of claim 7 , wherein the set of vectors describe at least one of: a spacing between mask features and a width of mask features.
13. A system comprising:
at least one computing device configured to perform actions including:
assigning a set of vectors to geometry data describing at least one mask for forming an integrated circuit (IC),
wherein assigning the set of vectors to the geometry data includes assigning a vector to each edge of the at least one mask, the vector including edge information for a plurality of nearest edges in the at least one mask;
adjusting a statistical predictive model of the at least one mask based upon the set of vectors and the geometry data;
predicting an adjustment to the at least one mask with the statistical predictive model; and
adjusting instructions for forming the at least one mask in response to a predicted mask result of the statistical predictive model deviating from a target mask result for the at least one mask.
14. The system of claim 13 , wherein predicting the adjustment to the at least one mask is performed in a single run prior to adjusting the instructions for forming the at least one mask.
15. The system of claim 13 , wherein the instructions for forming the at least one mask further include mask data correction instructions for modifying the geometry data based on the predicted adjustment.
16. The system of claim 13 , wherein the set of vectors describe at least one of: a fragmentation condition in the at least one mask, a segmentation condition in the at least one mask, a spacing between mask features and a width of mask features.
17. The system of claim 13 , wherein the set of vectors include a rule of sign for resolving a conflict between conditions in the geometry data.