IP Library Patent Application 15729192
Patent Application
App. No. 15/729,192

CLEANING SOLUTION

Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US None
App. No.
15/729,192
Abstract

A cleaning solution includes an acid and a surfactant blend. The cleaning solution can be used to clean a surface of a device.

Claims (39)

1 . A cleaning solution comprising

an organic acid comprising a compound of the formula

or a salt thereof, wherein G is selected from the group consisting of a bond, C 1-10 alkylene, C 2-10 alkenylene, C 2-10 alkynylene, C 1-10 heteroalkylene, C 2-10 heteroalkenylene, and C 2-10 heteroalkynylene, and wherein each hydrogen atom in C 1-10 alkylene, C 2-10 alkenylene, C 2-10 alkynylene, C 1-10 heteroalkylene, C 2-10 heteroalkenylene, and C 2-10 heteroalkynylene may be optionally substituted with one or more R N , wherein each R N is independently selected from the group consisting of—halo, oxo, —OH, —CN, —NO 2 , —CF 3 , —OCF 3 , —CO 2 H, and —NH 2 , and

a surfactant blend comprising a primary surfactant and a first co-surfactant.

2 . The cleaning solution of claim 1 , wherein G is a bond or —CH 2 C(OH)(CO 2 H)CH 2 —.

3 . The cleaning solution of claim 2 , wherein the primary surfactant comprises a compound having the formula

or a salt thereof, wherein a is an integer from 1-20, and Q is a bond or —C(O)CH 2 —.

4 . The cleaning solution of claim 3 , wherein a is 11 and Q is a bond.

5 . The cleaning solution of claim 4 , wherein the first co-surfactant comprises a compound having the formula

or a salt thereof, wherein each of b and c is independently an integer from 0 to 12, and d is an integer from 3 to 40.

6 . The cleaning solution of claim 5 , wherein d is 3 and the sum of b+c is 8 to 14.

7 . The cleaning solution of claim 5 , wherein d is 7 or 9 and the sum of b+c is 8 to 14.

8 . The cleaning solution of claim 1 , wherein the primary surfactant has a Hydrophile-Lipophile Balance (HLB) of at least about 15.

9 . The cleaning solution of claim 8 , wherein the first co-surfactant has an HLB selected from a range of about 12 to about 16.

10 . The cleaning solution of claim 1 , wherein the cleaning solution has a viscosity of at least 40,000 cps.

11 . A cleaning solution comprising

an organic acid, and

a surfactant blend comprising a primary surfactant having a Hydrophile-Lipophile Balance (HLB) of at least about 15, a first co-surfactant having an HLB selected from a range of about 12 to about 16, a second co-surfactant having an HLB selected from a range of about 6 to about 10, and an emulsifier.

12 . The cleaning solution of claim 11 , wherein the HLB of the primary surfactant is in a range of about 20 to about 45.

13 . The cleaning solution of claim 12 , wherein the primary surfactant comprises a compound having the formula

or a salt thereof, wherein a is an integer from 1-20, and Q is a bond or —C(O)CH 2 —.

14 . The cleaning solution of claim 11 , wherein the first co-surfactant comprises a compound having the formula

or a salt thereof, wherein the sum of b+c is 8 to 14, and d is 7 or 9.

15 . The cleaning solution of claim 14 , wherein the second co-surfactant comprises a compound having the formula

or a salt thereof, wherein the sum of b+c is 8 to 14, and d is 3.

16 . The cleaning solution of claim 15 , wherein the emulsifier comprises a compound having the formula

or a salt thereof, wherein each of w, x, y, and z is respectively an integer from 1-20, the sum of w, x, y, and z is a multiple of 20; and R is selected from the group consisting of C 10-20 alkyl, C 1-10 alkyl, C 10-20 alkenyl, C 2-10 alkenyl, C 10-20 alkynyl, C 2-10 alkynyl, C 10-20 heteroalkyl, C 1-10 heteroalkyl, C 10-° heteroalkenyl, C 2-10 heteroalkenyl, C 10-° heteroalkynyl, and C 2-10 heteroalkynyl, and wherein each hydrogen atom in C 10-° alkyl, C 1-10 alkyl, C 10-20 alkenyl, C 2-10 alkenyl, C 10-20 alkynyl, C 2-10 alkynyl, C 10-20 heteroalkyl, C 1-10 heteroalkyl, C 10-20 heteroalkenyl, C 2-10 heteroalkenyl, C 10-20 heteroalkynyl, and C 2-10 heteroalkynyl may be optionally substituted with one or more R M , and wherein each R M is independently selected from the group consisting of—halo, oxo, —OH, —CN, —NO 2 , —CF 3 , —OCF 3 , —CO 2 H, and —NH 2 .

17 . A method of cleaning a device, the method comprising

contacting the device with a first cleaning solution comprising a first organic acid and a first surfactant blend,

wherein the first organic acid comprises a compound of the formula

or a salt thereof, wherein G is selected from the group consisting of a bond, C 1-10 alkylene, C 2-  alkenylene, C 2-  alkynylene, C 1-10 heteroalkylene, C 2-10 heteroalkenylene, and C 2-10 heteroalkynylene, and wherein each hydrogen atom in C 1-10 alkylene, C 2-10 alkenylene, C 2-10 alkynylene, C 1-10 heteroalkylene, C 2-10 heteroalkenylene, and C 2-10 heteroalkynylene may be optionally substituted with one or more R N , wherein each R N is independently selected from the group consisting of—halo, oxo, —OH, —CN, —NO 2 , —CF 3 , —OCF 3 , —CO 2 H, and —NH 2 , and the first surfactant blend comprises a first primary surfactant and a first co-surfactant,

wherein the first cleaning solution has a viscosity less than about 10,000 cps.

18 . The method of claim 17 , wherein the method further comprises contacting the device with a second cleaning solution, wherein the second cleaning solution comprises a second organic acid, a second surfactant blend, and a thickening agent,

wherein the second organic acid comprises a compound of the formula

or a salt thereof, wherein G is selected from the group consisting of a bond, C 1-10 alkylene, C 2-10 alkenylene, C 2-10 alkynylene, C 1-10 heteroalkylene, C 2-10 heteroalkenylene, and C 2-10 heteroalkynylene, and wherein each hydrogen atom in C 1-10 alkylene, C 2-10 alkenylene, C 2-  alkynylene, C 1-10 heteroalkylene, C 2-10 heteroalkenylene, and C 2-10 heteroalkynylene may be optionally substituted with one or more R N , wherein each R N is independently selected from the group consisting of—halo, oxo, —OH, —CN, —NO 2 , —CF 3 , —OCF 3 , —CO 2 H, and —NH 2 ,

the second surfactant blend comprises a second primary surfactant and a second co-surfactant, and

the second cleaning solution has a viscosity greater than about 40,000 cps.

19 . The method of claim 18 , wherein the device is contacted with the second cleaning solution prior to contacting the device with the first cleaning solution.

20 . The method of claim 18 , wherein the first organic acid is substantially the same as the second organic acid and the first primary surfactant is substantially the same as the second primary surfactant.

Assignments (4)
RELEASE OF SECURITY INTEREST Recorded Nov 25, 2020
From: ARES CAPITAL CORPORATION
To: KVI LLC
Reel/Frame 054465/0625 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 5, 2018
From: MECTRA LABS, INC.
To: KVI LLC
Reel/Frame 047410/0792 →
SECURITY INTEREST Recorded Nov 5, 2018
From: KVI LLC
To: ARES CAPITAL CORPORATION, AS AGENT
Reel/Frame 047414/0272 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 12, 2017
From: BARKER, ALAN THOMAS; TERHUNE, LORENA E.
To: MECTRA LABS, INC.
Reel/Frame 044361/0355 →