IP Library Granted Patent US 10,290,762
Granted Patent B2
US 10,290,762 · App. 15/736,351 · Granted May 14, 2019

Metal oxide film formation method

Inventors: Takahiro Hiramatsu (Tokyo, JP); Hiroyuki Orita (Tokyo, JP); Toshiyuki Kawaharamura (Kochi, JP); Shizuo Fujita (Kyoto, JP); Takayuki Uchida (Kyoto, JP)
Assignees: Toshiba Mitsubishi-Electric Industrial Systems Corporation; Kochi Prefectural Public University Corporation; Kyoto University
H01L31/1868C23C16/40C23C16/403C23C16/4486C23C16/455H01L31/02167
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Quick Facts
Patent No.
US 10,290,762
App. No.
15/736,351
Granted
May 14, 2019
Kind
B2
Abstract

Disclosed herein in a method of forming a metal oxide film, which can provide a high-quality metal oxide film while enhancing production efficiency. The method includes the steps of: turning a raw-material solution having a metallic element into a mist, to obtain a raw-material solution mist; turning a reaction aiding solution into a mist, to obtain an aiding-agent mist; feeding the raw-material solution mist and the aiding-agent mist into a mixing vessel, thereby mixing the raw-material solution mist and the aiding-agent mist, to obtain a mixed mist; and feeding the mixed mist onto a back surface of a substrate which is heated, to obtain a metal oxide film.

Claims (18)

1. A method of forming a metal oxide film, the method comprising:

(a) turning a raw-material solution comprising a metallic element into a mist, to obtain a raw-material solution mist, in a first vessel;

(b) turning a reaction aiding solution comprising a reaction aiding agent for said metallic element into a mist, to obtain an aiding-agent mist, in a second vessel provided independently of said first vessel;

(c) mixing said raw-material solution mist and said aiding-agent mist, to obtain a mixed mist, in a mixing vessel which receives said raw-material solution mist and said aiding-agent mist via first and second paths provided independently of each other; and

(d) feeding said mixed mist obtained in (c) onto one main surface of a substrate in a reactor vessel while heating said substrate, to form a metal oxide film comprising said metallic element on said one main surface of said substrate,

wherein said mixing vessel comprises:

a vessel body;

first and second mist feeders which are connected to said first and second paths and are configured to feed said raw-material solution mist and said aiding-agent mist into said vessel body; and

a mist extraction unit, comprising a mixed-mist input port provided inside said vessel body and a mixed-mist output port provided outside said vessel body, and configured to receive said mixed mist from said mixed-mist input port and extract said mixed mist at said mixed-mist output port; wherein

said mixed mist provided from said mixed-mist output port is fed into said reactor vessel via a third path;

said vessel body comprises a mixing path configured to guide said raw-material solution mist and said aiding-agent mist, which are fed from said first and second mist feeders, to said mixed-mist input port while circulating said raw-material solution mist and said aiding-agent mist;

said first and second mist feeders are provided at the same height as formed in said vessel body; and

said mixed-mist input port is provided at a height as formed, which is less than that of said first and second mist feeders.

2. The method according to claim 1 , wherein:

said vessel body has a cylindrical shape;

said mist extraction unit is provided in a central portion of said vessel body in plan view, has a cylindrical shape with a hollow portion, comprises said mixed-mist input port in a lower surface, and comprises said mixed-mist output port in an upper surface; and

said mixing path is formed in a shape of a circumference in plan view by a space between an inner side surface of said vessel body and an outer side surface of said mist extraction unit.

3. The method according to claim 2 , wherein said first and second mist feeders are provided so as to feed said raw-material solution mist and said aiding-agent mist along a tangent of said inner side surface of said vessel body.

Assignments (2)
CHANGE OF NAME Recorded Apr 26, 2024
From: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
To: TMEIC CORPORATION
Reel/Frame 067244/0359 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 14, 2017
From: HIRAMATSU, TAKAHIRO; ORITA, HIROYUKI; KAWAHARAMURA, TOSHIYUKI; FUJITA, SHIZUO; UCHIDA, TAKAYUKI
To: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION; KOCHI PREFECTURAL PUBLIC UNIVERSITY CORPORATION; KYOTO UNIVERSITY
Reel/Frame 044394/0318 →
Continuity (1)
Related Publication 20180190859A1 · Jul 5, 2018