Electrochromic laminates
View Patent ↗Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.
1. An electrochromic laminate, comprising:
a first substrate;
a second substrate laminated to the first substrate, wherein the second substrate is a thin flexible substrate between about 0.1 mm and about 1 mm thick;
a lamination adhesive between the first substrate and the second substrate; and
an electrochromic device at a lamination interface between the first and the second substrates, wherein the electrochromic device is disposed on the second substrate;
wherein the first substrate has an infrared radiation reflective material layer disposed thereon, and wherein the infrared radiation reflective material layer is located outboard of the electrochromic device.
2. The electrochromic laminate of claim 1 , wherein the first substrate is a thick support substrate located outboard of the second substrate, the thick support substrate between about 3 mm and about 25 mm thick.
3. The electrochromic laminate of claim 2 ,
wherein the first substrate is located inboard of the second substrate; and
wherein a low emissivity coating is disposed on an inboard surface of the first substrate.
4. The electrochromic laminate of claim 3 , wherein the low emissivity coating comprises fluorinated tin oxide.
5. The electrochromic laminate of claim 2 , wherein the first substrate has a thickness between about 3 mm and about 12 mm.
6. The electrochromic laminate of claim 1 , wherein a low emissivity coating is disposed on an inboard surface of the second substrate.
7. The electrochromic laminate of claim 6 , wherein the low emissivity coating comprises fluorinated tin oxide.
8. The electrochromic laminate of claim 1 , wherein the first substrate is a thin, flexible substrate between about 0.1 mm and about 1 mm thick.
9. The electrochromic laminate of claim 8 , wherein a low emissivity coating is disposed on the inboard surface of the first substrate.
10. The electrochromic laminate of claim 9 , wherein the low emissivity coating comprises fluorinated tin oxide.
11. The electrochromic laminate of claim 1 , wherein the second substrate has a thickness of about 0.7 mm.
12. The electrochromic laminate of claim 1 , wherein at least one of the first and second substrates is in a prefabricated roll format.
13. The electrochromic laminate of claim 1 , wherein the infrared radiation reflective material layer is a TiO2/Ag/TiO2 coating.
14. An electrochromic laminate comprising:
a first substrate;
a second substrate laminated to the first substrate, wherein the second substrate is a thin, flexible substrate between about 0.1 mm and about 1 mm thick;
a lamination adhesive between the first substrate and the second substrate; and
an electrochromic device at a lamination interface between the first and the second substrates, wherein the electrochromic device is disposed on the first substrate;
wherein the second substrate has an infrared radiation reflective material layer disposed thereon, wherein the infrared radiation reflective material layer is located outboard of the electrochromic device.
15. The electrochromic laminate of claim 14 , wherein a low emissivity coating is disposed on an inboard surface of the second substrate.
16. The electrochromic laminate of claim 15 , wherein the first substrate is a thick support substrate between about 3 mm and about 25 mm thick, located outboard of the second substrate.
17. The electrochromic laminate of claim 15 , wherein the low emissivity coating comprises fluorinated tin oxide.
18. The electrochromic laminate of claim 14 ,
wherein the first substrate is a thick support substrate between about 3 mm and about 25 mm thick, located inboard of the second substrate; and
wherein a low emissivity coating is disposed on an inboard surface of the first substrate.
19. The electrochromic laminate of claim 18 , wherein the low emissivity coating comprises fluorinated tin oxide.
20. The electrochromic laminate of claim 14 , wherein the first substrate is a thin, flexible substrate between about 0.1 mm and about 1 mm thick.
21. The electrochromic laminate of claim 14 , wherein the second substrate has a thickness of about 0.7 mm.
22. The electrochromic laminate of claim 14 , wherein at least one of the first and second substrates is in a prefabricated roll format.
23. The electrochromic laminate of claim 14 , wherein the first substrate has a thickness between about 3 mm and about 12 mm.
24. The electrochromic laminate of claim 14 , wherein the infrared radiation reflective material layer is a TiO2/Ag/TiO2 coating.